Negative differential resistance of CaF2/Si double barrier resonant tunneling diodes fabricated using plasma etching mesa isolation process

2020 ◽  
Vol 59 (SI) ◽  
pp. SIIE03
Author(s):  
Yoshiro Kumagai ◽  
Satoshi Fukuyama ◽  
Hiroki Tonegawa ◽  
Kizashi Mikami ◽  
Kodai Hirose ◽  
...  
1992 ◽  
Vol 45 (24) ◽  
pp. 14407-14410 ◽  
Author(s):  
M. Tewordt ◽  
L. Marti´n-Moreno ◽  
J. T. Nicholls ◽  
M. Pepper ◽  
M. J. Kelly ◽  
...  

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