Dependence of beam emittance on plasma electrode temperature and rf-power, and filter-field tuning with center-gapped rod-filter magnets in J-PARC rf-driven H− ion source

2014 ◽  
Vol 85 (2) ◽  
pp. 02B133 ◽  
Author(s):  
A. Ueno ◽  
I. Koizumi ◽  
K. Ohkoshi ◽  
K. Ikegami ◽  
A. Takagi ◽  
...  
Keyword(s):  
Ion Source ◽  
Rf Power ◽  
Electrode Temperature ◽  
Beam Emittance ◽  
Plasma Electrode

scholarly journals Development of a new high-current triode extraction system for helicon ion source: design and simulation

2018 ◽  
Vol 36 (4) ◽  
pp. 477-486 ◽  
Author(s):  
M. Khoshhal ◽  
M. Habibi ◽  
Rod W. Boswell
Keyword(s):  
Ion Implantation ◽  
Ion Beam ◽  
Ion Source ◽  
High Current ◽  
Ion Temperature ◽  
Beam Emittance ◽  
Extraction Voltage ◽  
Parabolic Geometry ◽  
First Time ◽  
Plasma Electrode

AbstractThree triode extraction systems are simulated by IBSimu ion optical code for Amirkabir Helicon Ion Source (AHIS). The optimized pierce and suggested parabolic electrodes are introduced for the first time in this paper. The obtained N+ beam for parabolic geometry designed for ion implantation has 66 keV energy, and 10.4 mA current. Ion beam emittance and Twiss parameters of the emittance ellipse as the function of x term index are calculated for parabolic electrode equation. The simulated triode extraction systems have been evaluated by using of optimized parameters such as the extraction voltage, gap distance, plasma electrode (PE) aperture, and ion temperature. The extraction voltage, gap distance, PE aperture, and ion temperature have been changed in the range of 58–70 kV, 35–39 mm, 4–6 mm, and 0.5–4.4 eV in the simulations, respectively.

Low-RF-power growth of InN thin films by plasma-assisted reactive evaporation with a localized ion source

2017 ◽  
Vol 199 ◽  
pp. 408-415 ◽  
Author(s):  
M. Alizadeh ◽  
B.T. Goh ◽  
A.K. Pandey ◽  
C.F. Dee ◽  
S.A. Rahman
Keyword(s):  
Thin Films ◽  
Ion Source ◽  
Rf Power ◽  
Power Growth ◽  
Reactive Evaporation

Beam emittance measurements of transformer coupled plasma ion source for focused ion beam

2004 ◽  
Vol 75 (5) ◽  
pp. 1681-1683 ◽  
Author(s):  
Yoon Jae Kim ◽  
I. S. Hong ◽  
H. S. Kim ◽  
Y. S. Hwang
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Ion Source ◽  
Beam Emittance ◽  
Plasma Ion Source

H− ion source using a localized virtual magnetic filter in the plasma electrode: Type-I localized virtual magnetic filter

2000 ◽  
Vol 71 (2) ◽  
pp. 693-695 ◽  
Author(s):  
Y. Oka ◽  
O. Kaneko ◽  
K. Tsumori ◽  
Y. Takeiri ◽  
M. Osakabe ◽  
...  
Keyword(s):  
Ion Source ◽  
Type I ◽  
Magnetic Filter ◽  
Plasma Electrode
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