The structural and optical properties of black silicon by inductively coupled plasma reactive ion etching
2015 ◽
Vol 245
◽
pp. 8-13
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2004 ◽
Vol 43
(1)
◽
pp. 82-85
◽
2014 ◽
Vol 211
(10)
◽
pp. 2343-2346
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Keyword(s):
2020 ◽
Vol 120
◽
pp. 105284
Reactive ion etching of Pb(Zr[sub x]Ti[sub 1−x])O[sub 3] thin films in an inductively coupled plasma
1998 ◽
Vol 16
(4)
◽
pp. 1894
◽
Keyword(s):
Keyword(s):