Mesa‐type quantum cascade lasers fabricated by using inductively coupled plasma reactive ion etching
2016 ◽
Vol 25
(03n04)
◽
pp. 1640022
◽
2004 ◽
Vol 43
(1)
◽
pp. 82-85
◽
2014 ◽
Vol 211
(10)
◽
pp. 2343-2346
◽
Keyword(s):
Reactive ion etching of Pb(Zr[sub x]Ti[sub 1−x])O[sub 3] thin films in an inductively coupled plasma
1998 ◽
Vol 16
(4)
◽
pp. 1894
◽
Keyword(s):
Keyword(s):