Flexible vanadium oxide film for broadband transparent photodetector

2017 ◽  
Vol 110 (10) ◽  
pp. 101907 ◽  
Author(s):  
Hong-Sik Kim ◽  
Khushbu R. Chauhan ◽  
Joondong Kim ◽  
Eun Ha Choi
Keyword(s):  
Author(s):  
W. B. Cai ◽  
F. Wang ◽  
Y. P. Miao ◽  
J. Wei ◽  
K. L. Zhang

Tungsten-doped vanadium oxide has been proved to decrease the transition temperature, which enables vanadium oxide film to be more promising. Besides, the nano-structure can improve the properties of the film when compared with the as-deposited film. In this letter, a nano-structure tungsten-doped vanadium oxide film is proposed. Tungsten-doped vanadium oxide film was deposited on the Si (400) substrate by DC magnetron sputtering. The doping level was controlled by adjusting the sputtering time. Then the as-deposited film was annealed to form a nano-structure film at the temperature of 500 °C for 1 h in high vacuum. The morphology and crystalline structure of such films were characterized by AFM and XRD, respectively. Optical properties of the films were tested by FTIR, mainly comparing the infrared transmission before and after annealing.


1992 ◽  
Vol 57 (1-2) ◽  
pp. 41-47 ◽  
Author(s):  
K WEST ◽  
B ZACHAUCHRISTIANSEN ◽  
S SKAARUP ◽  
F POULSEN

2014 ◽  
Vol 609-610 ◽  
pp. 547-551
Author(s):  
Ya Qiao ◽  
Yong Shun Ling ◽  
Yuan Lu ◽  
Hua Yang

Direct current (DC) magnetron sputtering method was used to deposit vanadium oxide thin films on ordinary glass substrates from a vanadium metal target and a five factors four levels orthogonal experimental method was used to find the best combination of sputtering pressure, sputtering power, oxygen/argon flow ratio, substrate temperature and deposition time for fabricating high temperature coefficient of resistance (TCR) vanadium oxide film. The results indicate that a good combination of these parameters should be 1Pa, 160W, 1.5/25, 280°C and 60 minutes. And the film fabricated using this parameters combination is mainly composed of V2O5and has a resistance range of 80.3kΩ to 40kΩ while its temperature changed from 20°C to 80°C.


Plasmonics ◽  
2017 ◽  
Vol 13 (1) ◽  
pp. 287-291 ◽  
Author(s):  
Xiaoxia Zheng ◽  
Zhongyin Xiao ◽  
Xinyan Ling

2016 ◽  
Vol 65 (12) ◽  
pp. 127201
Author(s):  
Wang Pan-Pan ◽  
Zhang Yu-Zhi ◽  
Peng Ming-Dong ◽  
Zhang Yun-Long ◽  
Wu Ling-Nan ◽  
...  

Plasmonics ◽  
2022 ◽  
Author(s):  
Fu-yuan Yu ◽  
Xiong-jun Shang ◽  
Wei Fang ◽  
Qing-qing Zhang ◽  
Yan Wu ◽  
...  

2010 ◽  
Vol 28 (3) ◽  
pp. 466-471 ◽  
Author(s):  
He Yu ◽  
Yadong Jiang ◽  
Tao Wang ◽  
Zhiming Wu ◽  
Junsheng Yu ◽  
...  

2019 ◽  
Vol 32 (2) ◽  
pp. 445-453
Author(s):  
Seçil Akoğulları ◽  
Seda Çιnar ◽  
Kemal Volkan Özdokur ◽  
Tülin Aydemir ◽  
Fatma Nil Ertaş ◽  
...  

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