Atomic physics in Inertial Confinement Fusion (ICF)

Opacity calculations for targets used in inertial confinement fusion (ICF) needs sophisticated atomic physics models, assuming a large number of configurations and transitions to simulate the plasma. Depending on the degree of accuracy for calculations of targets for ICF, some hydrodynamic-radiation codes use multifrequency opacities or well mean opacities.In this work, using a sophisticated atomic physics code for LTE opacity calculations, that provides well multifrequency opacities or mean opacities, useful analytical opacity formulas for several single elements used in ICF have been generated, giving both Rosseland and Planck mean opacities as a function of the plasma parameters.

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Study of high-Z-coated ignition target by detailed configuration accounting atomic physics for direct-drive inertial confinement fusion

Plasma Physics and Controlled Fusion ◽

10.1088/1361-6587/aae2dc ◽

2018 ◽

Vol 61 (1) ◽

pp. 014006 ◽

Cited By ~ 2

Author(s):

Xiumei Qiao ◽

Ke Lan

Keyword(s):

Atomic Physics ◽

Inertial Confinement Fusion ◽

Inertial Confinement ◽

Direct Drive ◽

Confinement Fusion

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Analysis of electroless nickel thin films

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100086854 ◽

1991 ◽

Vol 49 ◽

pp. 510-511 ◽

Cited By ~ 1

Author(s):

C. W. Price ◽

E. F. Lindsey

Keyword(s):

Thin Films ◽

Inertial Confinement Fusion ◽

Electroless Nickel ◽

Inertial Confinement ◽

Plating Bath ◽

X Ray ◽

Nickel Thin Films ◽

Nickel Deposits ◽

Confinement Fusion ◽

Thickness Measurements

Thickness measurements of thin films are performed by both energy-dispersive x-ray spectroscopy (EDS) and x-ray fluorescence (XRF). XRF can measure thicker films than EDS, and XRF measurements also have somewhat greater precision than EDS measurements. However, small components with curved or irregular shapes that are used for various applications in the the Inertial Confinement Fusion program at LLNL present geometrical problems that are not conducive to XRF analyses but may have only a minimal effect on EDS analyses. This work describes the development of an EDS technique to measure the thickness of electroless nickel deposits on gold substrates. Although elaborate correction techniques have been developed for thin-film measurements by x-ray analysis, the thickness of electroless nickel films can be dependent on the plating bath used. Therefore, standard calibration curves were established by correlating EDS data with thickness measurements that were obtained by contact profilometry.

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