scholarly journals A high-intensity, RF plasma-sputter negative ion source

1999 ◽  
Author(s):  
G. D. Alton ◽  
R. Lohwasser ◽  
B. Cui ◽  
Y. Bao ◽  
T. Zhang ◽  
...  
Keyword(s):  
High Intensity ◽  
Ion Source ◽  
Negative Ion ◽  
Rf Plasma

Negative-Ion Implantation

1994 ◽  
Vol 354 ◽  
Author(s):  
Junzo Ishikawa
Keyword(s):  
Ion Implantation ◽  
Negative Ions ◽  
Ion Source ◽  
Negative Ion ◽  
Rf Plasma ◽  
Ion Currents ◽  
Promising Technique ◽  
Surface Charging ◽  
Silicon Carbon ◽  
A Charge

AbstractNegative-ion implantation is a promising technique for forthcoming ULSI (more than 256 M bits) fabrication and TFT (for color LCD) fabrication, since the surface charging voltage of insulated electrodes or insulators implanted by negative ions is found to saturate within so few as several volts, no breakdown of insulators would be expected without a charge neutralizer in these fabrication processes. Scatter-less negative-ion implantation into powders is also possible. For this purpose an rf-plasma-sputter type heavy negative-ion source was developed, which can deliver several milliamperes of various kinds of negative ion currents such as boron, phosphor, silicon, carbon, copper, oxygen, etc. A medium current negative-ion implanter with a small version of this type of ion source has been developed.

The properties of high‐intensity heavy‐negative‐ion source, NIABNIS

1990 ◽  
Vol 61 (1) ◽  
pp. 427-429 ◽  
Author(s):  
Hiroshi Tsuji ◽  
Junzo Ishikawa ◽  
Takeshi Maekawa ◽  
Toshinori Takagi
Keyword(s):  
High Intensity ◽  
Ion Source ◽  
Negative Ion

A compact multi-sample high-intensity negative ion source

1997 ◽  
Vol 123 (1-4) ◽  
pp. 550-553 ◽  
Author(s):  
W.Z. Gelbart ◽  
R.R. Johnson ◽  
M. Paul ◽  
D. Berkovits ◽  
A. Hershkowitz ◽  
...  
Keyword(s):  
High Intensity ◽  
Ion Source ◽  
Negative Ion

RF plasma sputter-type DC-mode heavy negative ion source

1992 ◽  
Author(s):  
H. Tsuji ◽  
J. Ishikawa ◽  
Y. Gotoh ◽  
Y. Okada
Keyword(s):  
Ion Source ◽  
Negative Ion ◽  
Rf Plasma

A modified high-intensity Cs sputter negative-ion source with multi-target mechanism

1993 ◽  
Vol 328 (1-2) ◽  
pp. 207-210 ◽  
Author(s):  
Si Houzhi ◽  
Zhang Weizhong ◽  
Zhu Jinhau ◽  
Du Guangtian ◽  
Zhang Tiaorong ◽  
...  
Keyword(s):  
High Intensity ◽  
Ion Source ◽  
Negative Ion
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