New method of light‐induced deposition of metal films on insulator‐on‐semiconductor substrates

1987 ◽  
Vol 50 (4) ◽  
pp. 215-217 ◽  
Author(s):  
S. K. Krawczyk ◽  
S. N. Kumar
Keyword(s):  
Metal Films ◽  
New Method ◽  
Semiconductor Substrates

Electrolytic Deposition of Thin Metal Films on Semiconductor Substrates

1977 ◽  
Vol 124 (7) ◽  
pp. 1012-1018 ◽  
Author(s):  
P. Bindra ◽  
H. Gerischer ◽  
D. M. Kolb
Keyword(s):  
Metal Films ◽  
Thin Metal ◽  
Electrolytic Deposition ◽  
Thin Metal Films ◽  
Semiconductor Substrates

Magnetic Metal Films on Semiconductor Substrates

1994 ◽  
pp. 1-44 ◽  
Author(s):  
G. A. Prinz
Keyword(s):  
Metal Films ◽  
Magnetic Metal ◽  
Semiconductor Substrates

ChemInform Abstract: ELECTROLYTIC DEPOSITION OF THIN METAL FILMS ON SEMICONDUCTOR SUBSTRATES

1977 ◽  
Vol 8 (43) ◽  
pp. no-no
Author(s):  
P. BINDRA ◽  
H. GERISCHER ◽  
D. M. KOLB
Keyword(s):  
Metal Films ◽  
Thin Metal ◽  
Electrolytic Deposition ◽  
Thin Metal Films ◽  
Semiconductor Substrates

A new method for the reduction of droplet deposition onto laser deposited thin metal films

1994 ◽  
Vol 241 (1-2) ◽  
pp. 134-137 ◽  
Author(s):  
E. van de Riet ◽  
U.K.P. Biermann ◽  
J. Dieleman
Keyword(s):  
Metal Films ◽  
Thin Metal ◽  
New Method ◽  
Thin Metal Films ◽  
Droplet Deposition

Transparency of thin metal films on semiconductor substrates

1976 ◽  
Vol 47 (11) ◽  
pp. 4968-4970 ◽  
Author(s):  
H. J. Hovel
Keyword(s):  
Metal Films ◽  
Thin Metal ◽  
Thin Metal Films ◽  
Semiconductor Substrates

scholarly journals A new method for fabricating ultrathin metal films as scratch-resistant flexible transparent electrodes

2015 ◽  
Vol 1 (1) ◽  
pp. 52-59 ◽  
Author(s):  
Yuan Liu ◽  
Chuan-Fei Guo ◽  
Siya Huang ◽  
Tianyi Sun ◽  
Yumei Wang ◽  
...  
Keyword(s):  
Metal Films ◽  
New Method ◽  
Transparent Electrodes ◽  
Ultrathin Metal Films ◽  
Flexible Transparent Electrodes

Macromolecular structures of biological specimens are not obscured by controlled osmium impregnation

1983 ◽  
Vol 41 ◽  
pp. 606-607
Author(s):  
Klaus-Ruediger Peters ◽  
Samuel A. Green
Keyword(s):  
Thin Films ◽  
Electrical Conductivity ◽  
Critical Point ◽  
Metal Films ◽  
High Magnification ◽  
Osmium Impregnation ◽  
Instrumental Resolution ◽  
20 Nm ◽  
Continuous Metal

High magnification imaging of macromolecules on metal coated biological specimens is limited only by wet preparation procedures since recently obtained instrumental resolution allows visualization of topographic structures as smal l as 1-2 nm. Details of such dimensions may be visualized if continuous metal films with a thickness of 2 nm or less are applied. Such thin films give sufficient contrast in TEM as well as in SEM (SE-I image mode). The requisite increase in electrical conductivity for SEM of biological specimens is achieved through the use of ligand mediated wet osmiuum impregnation of the specimen before critical point (CP) drying. A commonly used ligand is thiocarbohvdrazide (TCH), first introduced to TEM for en block staining of lipids and glvcomacromolecules with osmium black. Now TCH is also used for SEM. However, after ligand mediated osinification nonspecific osmium black precipitates were often found obscuring surface details with large diffuse aggregates or with dense particular deposits, 2-20 nm in size. Thus, only low magnification work was considered possible after TCH appl ication.

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