Specific features of the formation of optical waveguides, contact pads and electrical interconnections on lithium tantalate substrates

The article considers the formation of titanium channel optical waveguides in LiTaO3 substrates. These structures were obtained by dry etching of grooves in SF6 plasma and magnetron sputtering of titanium film. After that, waveguides were formed by plasma etching using photoresist as mask. Technological features and modes of microstructure production are described. Al contact pads were produced by magnetron sputtering thin metal films on LiTaO3. Aluminum wires were ultrasonically bonded to Al contact pads using Delvotec 5630. The developed technology of formation of contact pads and bonding modes made it possible to obtain a bonded joint with a bond strength of 23-25 Gs.

Nonlinear plasmonic response in atomically thin metal films

Nanoscale nonlinear optics is limited by the inherently weak nonlinear response of conventional materials and the small light–matter interaction volumes available in nanostructures. Plasmonic excitations can alleviate these limitations through subwavelength light focusing, boosting optical near fields that drive the nonlinear response, but also suffering from large inelastic losses that are further aggravated by fabrication imperfections. Here, we theoretically explore the enhanced nonlinear response arising from extremely confined plasmon polaritons in few-atom-thick crystalline noble metal films. Our results are based on quantum-mechanical simulations of the nonlinear optical response in atomically thin metal films that incorporate crucial electronic band structure features associated with vertical quantum confinement, electron spill-out, and surface states. We predict an overall enhancement in plasmon-mediated nonlinear optical phenomena with decreasing film thickness, underscoring the importance of surface and electronic structure in the response of ultrathin metal films.

Obtaining thin metal films and their compounds using magnetron sputtering and arc evaporation in a single technological cycle

The authors of the article consider the possibility of obtaining thin films using magnetron sputtering and arc evaporation. The prospects of combining these methods in a single processing unit for obtaining films with high performance characteristics have been shown.