Target normal sheath acceleration by fs laser and advanced           carbon foils with gold films and nanoparticles

In this work, we examine Fermi relaxation in 20 nm Au films with pump-probe themoreflectance using a thin film, intraband thermoreflectance model. Our results indicate that the Fermi relaxation of a perturbed electron system occurs approximately 1.10±0.05 ps after absorption of a 785 nm, 185 fs laser pulse. This is in agreement with reported values from electron emission experiments but is higher than the Fermi relaxation time determined from previous thermoreflectance measurements. This discrepancy arises due to thermoreflectance modeling and elucidates the importance of the use of a proper thermoreflectance model for thermophysical property determination in pump-probe experiments.

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Optical reconfiguration and polarization control in semi-continuous gold films close to the percolation threshold

Nanoscale ◽

10.1039/c7nr03378h ◽

2017 ◽

Vol 9 (33) ◽

pp. 12014-12024 ◽

Cited By ~ 10

Author(s):

Christian Frydendahl ◽

Taavi Repän ◽

Mathias Geisler ◽

Sergey M. Novikov ◽

Jonas Beermann ◽

...

Keyword(s):

Optical Properties ◽

Percolation Threshold ◽

Writing Process ◽

Laser Pulses ◽

Metal Films ◽

Gold Films ◽

Laser Writing ◽

Polarization Control ◽

Fs Laser ◽

Continuous Metal

fs-Laser pulses can be used to locally alter the morphology and optical properties of semi-continuous metal films in a simple laser writing process.

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X-Ray Replication of Submicrometer Linewidth Patterns

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100078250 ◽

1977 ◽

Vol 35 ◽

pp. 136-137

Author(s):

Henry I. Smith ◽

D.C. Flanders

Keyword(s):

Electron Beam Lithography ◽

Cross Sectional ◽

X Ray ◽

Electron Backscattering ◽

Spatial Frequencies ◽

Cross Sectional Profile ◽

Carbon Foils ◽

Sectional Profile ◽

And Control ◽

Soft Radiation

Scanning electron beam lithography has been used for a number of years to write submicrometer linewidth patterns in radiation sensitive films (resist films) on substrates. On semi-infinite substrates, electron backscattering severely limits the exposure latitude and control of cross-sectional profile for patterns having fundamental spatial frequencies below about 4000 Å(l),Recently, STEM'S have been used to write patterns with linewidths below 100 Å. To avoid the detrimental effects of electron backscattering however, the substrates had to be carbon foils about 100 Å thick (2,3). X-ray lithography using the very soft radiation in the range 10 - 50 Å avoids the problem of backscattering and thus permits one to replicate on semi-infinite substrates patterns with linewidths of the order of 1000 Å and less, and in addition provides means for controlling cross-sectional profiles. X-radiation in the range 4-10 Å on the other hand is appropriate for replicating patterns in the linewidth range above about 3000 Å, and thus is most appropriate for microelectronic applications (4 - 6).

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Quality films from carbon fiber evaporation for thorough coverage of TEM grids

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100104157 ◽

1988 ◽

Vol 46 ◽

pp. 418-419

Author(s):

N. Tempel ◽

M. C. Ledbetter

Keyword(s):

Electron Microscopy ◽

High Resolution Electron Microscopy ◽

Carbon Films ◽

Low Noise ◽

Vacuum Evaporation ◽

High Yield ◽

Good Adhesion ◽

Noise Structure ◽

Resolution Electron ◽

Carbon Foils

Carbon films have been a support of choice for high resolution electron microscopy since the introduction of vacuum evaporation of carbon. The desirable qualities of carbon films and methods of producing them has been extensively reviewed. It is difficult to get a high yield of grids by many of these methods, especially if virtually all of the windows must be covered with a tightly bonded, quality film of predictable thickness. We report here a method for producing carbon foils designed to maximize these attributes: 1) coverage of virtually all grid windows, 2) freedom from holes, wrinkles or folds, 3) good adhesion between film and grid, 4) uniformity of film and low noise structure, 5) predictability of film thickness, and 6) reproducibility.Our method utilizes vacuum evaporation of carbon from a fiber onto celloidin film and grid bars, adhesion of the film complex to the grid by carbon-carbon contact, and removal of the celloidin by acetone dissolution. Materials must be of high purity, and cleanliness must be rigorously maintained.

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Relative Intensities in ED Patterns From Thin Gold Films

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100096436 ◽

1972 ◽

Vol 30 ◽

pp. 636-637

Author(s):

R. H. Morriss ◽

J. D. C. Peng ◽

C. D. Melvin

Keyword(s):

Theoretical Calculations ◽

Diffraction Theory ◽

Gold Films ◽

Reasonable Accuracy ◽

Experimental Conditions ◽

Crystal Perfection ◽

Heavy Atoms ◽

Fine Focus ◽

Convergent Beam ◽

Beam Diffraction

Although dynamical diffraction theory was modified for electrons by Bethe in 1928, relatively few calculations have been carried out because of computational difficulties. Even fewer attempts have been made to correlate experimental data with theoretical calculations. The experimental conditions are indeed stringent - not only is a knowledge of crystal perfection, morphology, and orientation necessary, but other factors such as specimen contamination are important and must be carefully controlled. The experimental method of fine-focus convergent-beam electron diffraction has been successfully applied by Goodman and Lehmpfuhl to single crystals of MgO containing light atoms and more recently by Lynch to single crystalline (111) gold films which contain heavy atoms. In both experiments intensity distributions were calculated using the multislice method of n-beam diffraction theory. In order to obtain reasonable accuracy Lynch found it necessary to include 139 beams in the calculations for gold with all but 43 corresponding to beams out of the [111] zone.

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“Preparation of Single Crystalline Gold Films for ED Studies”

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100096424 ◽

1972 ◽

Vol 30 ◽

pp. 634-635

Author(s):

Joseph D. C. Peng

Keyword(s):

Crystal Morphology ◽

Diffraction Theory ◽

Scattering Matrix ◽

Vacuum Evaporation ◽

Gold Films ◽

Matrix Formulation ◽

Silver Films ◽

Single Crystalline ◽

Grating Pattern ◽

Stacking Disorder

The relative intensities of the ED spots in a cross-grating pattern can be calculated using N-beam electron diffraction theory. The scattering matrix formulation of N-beam ED theory has been previously applied to imperfect microcrystals of gold containing stacking disorder (coherent twinning) in the (111) crystal plane. In the present experiment an effort has been made to grow single-crystalline, defect-free (111) gold films of a uniform and accurately know thickness using vacuum evaporation techniques. These represent stringent conditions to be met experimentally; however, if a meaningful comparison is to be made between theory and experiment, these factors must be carefully controlled. It is well-known that crystal morphology, perfection, and orientation each have pronounced effects on relative intensities in single crystals.The double evaporation method first suggested by Pashley was employed with some modifications. Oriented silver films of a thickness of about 1500Å were first grown by vacuum evaporation on freshly cleaved mica, with the substrate temperature at 285° C during evaporation with the deposition rate at 500-800Å/sec.

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Hole Formation in Gold Films

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100095807 ◽

1972 ◽

Vol 30 ◽

pp. 510-511

Author(s):

R. W. Vook ◽

R. Cook ◽

R. Ziemer

Keyword(s):

Deposition Rate ◽

Quartz Crystal ◽

Evaporation Rate ◽

Gold Films ◽

Hole Density ◽

Hole Formation ◽

Microscope Slide ◽

Crystal Film ◽

Glass Microscope Slide ◽

Glass Microscope

During recent experiments on Au films, a qualitative correlation between hole formation and deposition rate was observed. These early studies were concerned with films 80 to 1000A thick deposited on glass at -185°C and annealed at 170°C. In the present studies this earlier work was made quantitative. Deposition rates varying between 5 and 700 A/min were used. The effects of deposition rate on hole density for two films 300 and 700A thick were investigated.Au was evaporated from an outgassed W filament located 10 cm from a glass microscope slide substrate and a quartz crystal film thickness monitor. A shutter separating the filament from the substrate and monitor made it possible to obtain a constant evaporation rate before initiating deposition. The pressure was reduced to less than 1 x 10-6 torr prior to cooling the substrate with liquid nitrogen. The substrate was cooled in 15 minutes during which the pressure continued to drop to the mid 10-7 torr range, where deposition was begun.

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On the role of tin underlays for the prevention of thermal grooving in thin gold films

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100145030 ◽

1986 ◽

Vol 44 ◽

pp. 732-733

Author(s):

Jin Young Kim ◽

R. E. Hummel ◽

R. T. DeHoff

Keyword(s):

Thin Film ◽

Free Surface ◽

Grain Boundary ◽

Beneficial Effect ◽

Failure Mechanism ◽

Failure Mechanisms ◽

Distinct Advantage ◽

Gold Films ◽

Gold Thin Film

Gold thin film metallizations in microelectronic circuits have a distinct advantage over those consisting of aluminum because they are less susceptible to electromigration. When electromigration is no longer the principal failure mechanism, other failure mechanisms caused by d.c. stressing might become important. In gold thin-film metallizations, grain boundary grooving is the principal failure mechanism.Previous studies have shown that grain boundary grooving in gold films can be prevented by an indium underlay between the substrate and gold. The beneficial effect of the In/Au composite film is mainly due to roughening of the surface of the gold films, redistribution of indium on the gold films and formation of In2O3 on the free surface and along the grain boundaries of the gold films during air annealing.

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Investigation of thin sections of biological standards by EDX, EELS, and Auger electron spectroscopy

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s042482010013451x ◽

1990 ◽

Vol 48 (2) ◽

pp. 184-185

Author(s):

S. Lehner ◽

H.E. Bauer ◽

R. Wurster ◽

H. Seiler

Keyword(s):

Processing System ◽

Beam Current ◽

Beam Diameter ◽

Thin Sections ◽

Biologically Relevant ◽

Energy Filtering ◽

Low Viscosity ◽

Carbon Foils ◽

Electron Microscopical ◽

Exchange Membrane

In order to compare different microanalytical techniques commercially available cation exchange membrane SC-1 (Stantech Inc, Palo Alto), was loaded with biologically relevant elements as Na, Mg, K, and Ca, respectively, each to its highest possible concentration, given by the number concentration of exchangeable binding sites (4 % wt. for Ca). Washing in distilled water, dehydration through a graded series of ethanol, infiltration and embedding in Spurr’s low viscosity epoxy resin was followed by thin sectioning. The thin sections (thickness of about 50 nm) were prepared on carbon foils and mounted on electron microscopical finder grids.The samples were analyzed with electron microprobe JXA 50A with transmitted electron device, EDX system TN 5400, and on line operating image processing system SEM-IPS, energy filtering electron microscope CEM 902 with EELS/ESI and Auger spectrometer 545 Perkin Elmer.With EDX, a beam current of some 10-10 A and a beam diameter of about 10 nm, a minimum-detectable mass of 10-20 g Ca seems within reach.

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