Study of the effect of different plasma-enhanced chemical vapour deposition reactor configurations on the properties of hydrogenated amorphous silicon thin films

H. Aguas, V. Silva, I. Ferreira, E. Fo

doi:10.1080/014186300255122

Study of the effect of different plasma-enhanced chemical vapour deposition reactor configurations on the properties of hydrogenated amorphous silicon thin films

Philosophical Magazine B ◽

10.1080/014186300255122 ◽

2000 ◽

Vol 80 (4) ◽

pp. 475-486

Author(s):

H. Aguas, V. Silva, I. Ferreira, E. Fo

Keyword(s):

Thin Films ◽

Amorphous Silicon ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapour ◽

Silicon Thin Films ◽

Hydrogenated Amorphous

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Study of the effect of different plasma-enhanced chemical vapour deposition reactor configurations on the properties of hydrogenated amorphous silicon thin films

Philosophical Magazine B ◽

10.1080/13642810008209755 ◽

2000 ◽

Vol 80 (4) ◽

pp. 475-486 ◽

Cited By ~ 8

Author(s):

H. águas ◽

V. Silva ◽

I. Ferreira ◽

E. Fortunato ◽

R. Martins

Keyword(s):

Thin Films ◽

Amorphous Silicon ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapour ◽

Silicon Thin Films ◽

Hydrogenated Amorphous

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Preparation of hydrogenated amorphous silicon carbide thin films by plasma enhanced chemical vapour deposition

Vacuum ◽

10.1016/s0042-207x(98)00031-1 ◽

1998 ◽

Vol 50 (1-2) ◽

pp. 103-105 ◽

Cited By ~ 4

Author(s):

J Huran ◽

J Šafránková ◽

A.P. Kobzev

Keyword(s):

Thin Films ◽

Silicon Carbide ◽

Amorphous Silicon ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapour ◽

Amorphous Silicon Carbide ◽

Hydrogenated Amorphous

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Multi-phase structured hydrogenated amorphous silicon carbon nitride thin films grown by plasma enhanced chemical vapour deposition

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2017.05.289 ◽

2017 ◽

Vol 721 ◽

pp. 70-79 ◽

Cited By ~ 9

Author(s):

Mohd Azam Abdul Rahman ◽

Wee Siong Chiu ◽

Choon Yian Haw ◽

Ragib Badaruddin ◽

Fatemeh Shariatmadar Tehrani ◽

...

Keyword(s):

Thin Films ◽

Amorphous Silicon ◽

Chemical Vapour Deposition ◽

Carbon Nitride ◽

Vapour Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapour ◽

Silicon Carbon ◽

Multi Phase ◽

Hydrogenated Amorphous

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Inductively-coupled plasma-enhanced chemical vapour deposition of hydrogenated amorphous silicon carbide thin films for MEMS

Sensors and Actuators A Physical ◽

10.1016/j.sna.2016.05.042 ◽

2016 ◽

Vol 247 ◽

pp. 647-655 ◽

Cited By ~ 14

Author(s):

Tobias Frischmuth ◽

Michael Schneider ◽

Daniel Maurer ◽

Thomas Grille ◽

Ulrich Schmid

Keyword(s):

Thin Films ◽

Silicon Carbide ◽

Amorphous Silicon ◽

Chemical Vapour Deposition ◽

Inductively Coupled Plasma ◽

Vapour Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapour ◽

Inductively Coupled ◽

Hydrogenated Amorphous

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Correlation between short-range order and hydrogen bonding in hydrogenated amorphous silicon obtained by homogeneous chemical vapour deposition

Philosophical Magazine B ◽

10.1080/01418639408240283 ◽

1994 ◽

Vol 70 (6) ◽

pp. 1187-1193 ◽

Cited By ~ 2

Author(s):

A. Toneva ◽

P. Danesh ◽

L. Vassilev ◽

V. Kudoyarova

Keyword(s):

Hydrogen Bonding ◽

Amorphous Silicon ◽

Chemical Vapour Deposition ◽

Short Range ◽

Short Range Order ◽

Vapour Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapour ◽

Homogeneous Chemical ◽

Hydrogenated Amorphous

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Blue Light Emission from Hydrogenated Amorphous Silicon Carbide Prepared by Xylene Source in Plasma-Enhanced Chemical Vapour Deposition System

Chinese Physics Letters ◽

10.1088/0256-307x/13/12/020 ◽

1996 ◽

Vol 13 (12) ◽

pp. 947-949 ◽

Cited By ~ 6

Author(s):

Tian-fu Ma ◽

Kun-ji Chen ◽

Jia-fang Du ◽

Jun Xu ◽

Wei Li ◽

...

Keyword(s):

Silicon Carbide ◽

Amorphous Silicon ◽

Blue Light ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Light Emission ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapour ◽

Blue Light Emission ◽

Hydrogenated Amorphous

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Plasma Enhanced Chemical Vapour Deposition of Hydrogenated Amorphous Silicon from Dichlorosilane and Silane Gas Mixtures

Japanese Journal of Applied Physics ◽

10.1143/jjap.34.l536 ◽

1995 ◽

Vol 34 (Part 2, No. 5A) ◽

pp. L536-L538 ◽

Cited By ~ 17

Author(s):

Ian S. Osborne ◽

Nobuhiro Hata ◽

Akihisa Matsuda

Keyword(s):

Amorphous Silicon ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapour ◽

Gas Mixtures ◽

Hydrogenated Amorphous

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Thermal modification of wide-bandgap hydrogenated amorphous silicon-carbon alloy films grown by plasma-enhanced chemical vapour deposition from C2H2+SiH4 mixtures

Philosophical Magazine B ◽

10.1080/13642819708202333 ◽

1997 ◽

Vol 75 (4) ◽

pp. 485-496 ◽

Cited By ~ 6

Author(s):

Yichun Liu ◽

F. Giorgis ◽

C. F. Pirri

Keyword(s):

Amorphous Silicon ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapour ◽

Wide Bandgap ◽

Thermal Modification ◽

Alloy Films ◽

Silicon Carbon ◽

Hydrogenated Amorphous

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Photo-enhanced chemical vapour deposition of hydrogenated amorphous silicon carbon using an internal discharge lamp

Materials Science and Engineering B ◽

10.1016/0921-5107(95)01390-3 ◽

1995 ◽

Vol 35 (1-3) ◽

pp. 138-144 ◽

Cited By ~ 1

Author(s):

S. Miyajima ◽

W.I. Milne ◽

S.F. Yoon ◽

H.S. Tan

Keyword(s):

Amorphous Silicon ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapour ◽

Discharge Lamp ◽

Silicon Carbon ◽

Hydrogenated Amorphous

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Raman scattering from hydrogenated amorphous silicon obtained by homogeneous chemical vapour deposition

Philosophical Magazine B ◽

10.1080/01418639608243523 ◽

1996 ◽

Vol 74 (3) ◽

pp. 269-274

Author(s):

L. Vassilev ◽

A. Toneva

Keyword(s):

Raman Scattering ◽

Amorphous Silicon ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapour ◽

Homogeneous Chemical ◽

Hydrogenated Amorphous

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