Ion-beam processing of hydrogenated amorphous silicon carbide grown by plasma-enhanced chemical vapour deposition

Philosophical Magazine B ◽

10.1080/014186300255195 ◽

2000 ◽

Vol 80 (4) ◽

pp. 539-546

Author(s):

L. Calcagno, F. Giorgis, A. Makhtari,

Keyword(s):

Silicon Carbide ◽

Amorphous Silicon ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Ion Beam ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapour ◽

Amorphous Silicon Carbide ◽

Hydrogenated Amorphous

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Ion-beam processing of hydrogenated amorphous silicon carbide grown by plasma-enhanced chemical vapour deposition

Philosophical Magazine B ◽

10.1080/13642810008209762 ◽

2000 ◽

Vol 80 (4) ◽

pp. 539-546 ◽

Author(s):

L. Calcagno ◽

F. Giorgis ◽

A. Makhtari ◽

P. Musumeci ◽

R. Reitano

Keyword(s):

Silicon Carbide ◽

Amorphous Silicon ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Ion Beam ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapour ◽

Amorphous Silicon Carbide ◽

Hydrogenated Amorphous

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Preparation of hydrogenated amorphous silicon carbide thin films by plasma enhanced chemical vapour deposition

Vacuum ◽

10.1016/s0042-207x(98)00031-1 ◽

1998 ◽

Vol 50 (1-2) ◽

pp. 103-105 ◽

Author(s):

J Huran ◽

J Šafránková ◽

A.P. Kobzev

Keyword(s):

Silicon Carbide ◽

Amorphous Silicon ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapour ◽

Amorphous Silicon Carbide ◽

Hydrogenated Amorphous

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Blue Light Emission from Hydrogenated Amorphous Silicon Carbide Prepared by Xylene Source in Plasma-Enhanced Chemical Vapour Deposition System

Chinese Physics Letters ◽

10.1088/0256-307x/13/12/020 ◽

1996 ◽

Vol 13 (12) ◽

pp. 947-949 ◽

Author(s):

Tian-fu Ma ◽

Kun-ji Chen ◽

Jia-fang Du ◽

Jun Xu ◽

Wei Li ◽

...

Keyword(s):

Silicon Carbide ◽

Amorphous Silicon ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Light Emission ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapour ◽

Blue Light Emission ◽

Hydrogenated Amorphous

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Structural and optical properties of hydrogenated amorphous silicon carbide films by helicon wave plasma-enhanced chemical vapour deposition

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/37/23/012 ◽

2004 ◽

Vol 37 (23) ◽

pp. 3304-3308 ◽

Author(s):

Wei Yu ◽

Wanbing Lu ◽

Li Han ◽

Guangsheng Fu

Keyword(s):

Silicon Carbide ◽

Optical Properties ◽

Amorphous Silicon ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapour ◽

Structural And Optical Properties ◽

Helicon Wave ◽

Hydrogenated Amorphous

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Inductively-coupled plasma-enhanced chemical vapour deposition of hydrogenated amorphous silicon carbide thin films for MEMS

Sensors and Actuators A Physical ◽

10.1016/j.sna.2016.05.042 ◽

2016 ◽

Vol 247 ◽

pp. 647-655 ◽

Author(s):

Tobias Frischmuth ◽

Michael Schneider ◽

Daniel Maurer ◽

Thomas Grille ◽

Ulrich Schmid

Keyword(s):

Silicon Carbide ◽

Amorphous Silicon ◽

Chemical Vapour Deposition ◽

Inductively Coupled Plasma ◽

Vapour Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapour ◽

Inductively Coupled ◽

Hydrogenated Amorphous

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Correlation between short-range order and hydrogen bonding in hydrogenated amorphous silicon obtained by homogeneous chemical vapour deposition

Philosophical Magazine B ◽

10.1080/01418639408240283 ◽

1994 ◽

Vol 70 (6) ◽

pp. 1187-1193 ◽

Author(s):

A. Toneva ◽

P. Danesh ◽

L. Vassilev ◽

V. Kudoyarova

Keyword(s):

Hydrogen Bonding ◽

Amorphous Silicon ◽

Chemical Vapour Deposition ◽

Short Range ◽

Short Range Order ◽

Vapour Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapour ◽

Homogeneous Chemical ◽

Hydrogenated Amorphous

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Plasma Enhanced Chemical Vapour Deposition of Hydrogenated Amorphous Silicon from Dichlorosilane and Silane Gas Mixtures

Japanese Journal of Applied Physics ◽

10.1143/jjap.34.l536 ◽

1995 ◽

Vol 34 (Part 2, No. 5A) ◽

pp. L536-L538 ◽

Author(s):

Ian S. Osborne ◽

Nobuhiro Hata ◽

Akihisa Matsuda

Keyword(s):

Amorphous Silicon ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapour ◽

Gas Mixtures ◽

Hydrogenated Amorphous

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Thermal modification of wide-bandgap hydrogenated amorphous silicon-carbon alloy films grown by plasma-enhanced chemical vapour deposition from C2H2+SiH4 mixtures

Philosophical Magazine B ◽

10.1080/13642819708202333 ◽

1997 ◽

Vol 75 (4) ◽

pp. 485-496 ◽

Author(s):

Yichun Liu ◽

F. Giorgis ◽

C. F. Pirri

Keyword(s):

Amorphous Silicon ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapour ◽

Wide Bandgap ◽

Thermal Modification ◽

Alloy Films ◽

Silicon Carbon ◽

Hydrogenated Amorphous

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Photo-enhanced chemical vapour deposition of hydrogenated amorphous silicon carbon using an internal discharge lamp

Materials Science and Engineering B ◽

10.1016/0921-5107(95)01390-3 ◽

1995 ◽

Vol 35 (1-3) ◽

pp. 138-144 ◽

Author(s):

S. Miyajima ◽

W.I. Milne ◽

S.F. Yoon ◽

H.S. Tan

Keyword(s):

Amorphous Silicon ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapour ◽

Discharge Lamp ◽

Silicon Carbon ◽

Hydrogenated Amorphous

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Ion beam-induced chemical vapor deposition with hexamethyldisilane for hydrogenated amorphous silicon carbide and silicon carbonitride films

Surface and Coatings Technology ◽

10.1016/s0257-8972(03)00130-0 ◽

2003 ◽

Vol 169-170 ◽

pp. 624-627 ◽

Author(s):

Takaomi Matsutani ◽

Tatsuya Asanuma ◽

Chang Liu ◽

Masato Kiuchi ◽

Takae Takeuchi

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Ion Beam ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Carbonitride ◽

Amorphous Silicon Carbide ◽

Hydrogenated Amorphous

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