Apparatus Design for Glow-Discharge a-Si: H Film-Deposition

International Journal of Solar Energy ◽

10.1080/01425918708914428 ◽

1987 ◽

Vol 5 (5-6) ◽

pp. 311-322 ◽

Author(s):

A. GALLAGHER

Keyword(s):

Glow Discharge ◽

Film Deposition ◽

Apparatus Design

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Diamond film deposition by downstream d.c. glow discharge plasma chemical vapour deposition

Diamond and Related Materials ◽

10.1016/0925-9635(94)90218-6 ◽

1994 ◽

Vol 3 (4-6) ◽

pp. 531-533 ◽

Author(s):

V.M. Polushkin ◽

S.N. Polyakov ◽

A.T. Rakhimov ◽

N.V. Suetin ◽

M.A. Timofeyev ◽

...

Keyword(s):

Glow Discharge ◽

Chemical Vapour Deposition ◽

Diamond Film ◽

Vapour Deposition ◽

Discharge Plasma ◽

Chemical Vapour ◽

Film Deposition ◽

Glow Discharge Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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Thin film deposition of conductive tin oxide from tetramethyltin in a low pressure glow discharge diode reactor

Thin Solid Films ◽

10.1016/0040-6090(94)90442-1 ◽

1994 ◽

Vol 241 (1-2) ◽

pp. 282-286 ◽

Author(s):

Y. Farber ◽

F. Khonsari-Arefi ◽

J. Amouroux

Keyword(s):

Thin Film ◽

Glow Discharge ◽

Tin Oxide ◽

Thin Film Deposition ◽

Low Pressure ◽

Film Deposition ◽

Pressure Glow Discharge

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Study of an atmospheric pressure glow discharge (APG) for thin film deposition

Surface and Coatings Technology ◽

10.1016/s0257-8972(02)00487-5 ◽

2003 ◽

Vol 163-164 ◽

pp. 323-330 ◽

Author(s):

Rüdiger Foest ◽

Frank Adler ◽

Florian Sigeneger ◽

Martin Schmidt

Keyword(s):

Thin Film ◽

Glow Discharge ◽

Atmospheric Pressure ◽

Thin Film Deposition ◽

Film Deposition ◽

Atmospheric Pressure Glow Discharge ◽

Pressure Glow Discharge

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Organic thin film deposition by glow discharge process. RF sputtering.

Hyomen Kagaku ◽

10.1380/jsssj.5.468 ◽

1984 ◽

Vol 5 (4) ◽

pp. 468-474 ◽

Author(s):

Makoto KITOH

Keyword(s):

Thin Film ◽

Glow Discharge ◽

Rf Sputtering ◽

Thin Film Deposition ◽

Film Deposition ◽

Discharge Process ◽

Organic Thin Film

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The preparation of substrates for film deposition using glow discharge techniques

Vacuum ◽

10.1016/s0042-207x(80)81073-6 ◽

1980 ◽

Vol 30 (1) ◽

pp. 40

Keyword(s):

Glow Discharge ◽

Film Deposition

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Emission spectroscopy of glow‐discharge and sputtering plasmas used in amorphous Si:H film deposition

Journal of Vacuum Science and Technology ◽

10.1116/1.570665 ◽

1980 ◽

Vol 17 (6) ◽

pp. 1332-1335 ◽

Author(s):

M. A. Paesler ◽

T. Okumura ◽

W. Paul

Keyword(s):

Glow Discharge ◽

Emission Spectroscopy ◽

Film Deposition

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Erratum: Emission spectroscopy of glow‐discharge and sputtering plasmas used in amorphous Si:H film deposition

Journal of Vacuum Science and Technology ◽

10.1116/1.570685 ◽

1981 ◽

Vol 18 (1) ◽

pp. 111-111

Author(s):

M. A. Paesler ◽

T. Okumura ◽

W. Paul

Keyword(s):

Glow Discharge ◽

Emission Spectroscopy ◽

Film Deposition

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Investigation of metal evaporation and film deposition with a high voltage glow-discharge electron gun under middle vacuum

XXIst International Symposium on Discharges and Electrical Insulation in Vacuum, 2004. Proceedings. ISDEIV. ◽

10.1109/deiv.2004.1422681 ◽

2005 ◽

Author(s):

I.V. Melnyk ◽

V.I. Melnyk ◽

P.V. Porytskyy

Keyword(s):

Glow Discharge ◽

High Voltage ◽

Film Deposition ◽

Electron Gun ◽

Metal Evaporation

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968. Thin film deposition by decomposition of metallic alciholates in the plasma of a glow discharge

Vacuum ◽

10.1016/0042-207x(67)90970-0 ◽

1967 ◽

Vol 17 (5) ◽

pp. 299

Keyword(s):

Thin Film ◽

Glow Discharge ◽

Thin Film Deposition ◽

Film Deposition

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Diamondlike carbon film deposition on a polycarbonate-tube inner wall using a cylindrical electrode with radio frequency glow discharge plasma

Journal of Applied Physics ◽

10.1063/1.1832751 ◽

2005 ◽

Vol 97 (2) ◽

pp. 024906 ◽

Author(s):

Yasuharu Ohgoe ◽

Kenji K. Hirakuri

Keyword(s):

Glow Discharge ◽

Radio Frequency ◽

Discharge Plasma ◽

Carbon Film ◽

Film Deposition ◽

Glow Discharge Plasma ◽

Cylindrical Electrode ◽

Radio Frequency Glow Discharge ◽

Diamondlike Carbon

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