Diamond film deposition by downstream d.c. glow discharge plasma chemical vapour deposition

1994 ◽  
Vol 3 (4-6) ◽  
pp. 531-533 ◽  
Author(s):  
V.M. Polushkin ◽  
S.N. Polyakov ◽  
A.T. Rakhimov ◽  
N.V. Suetin ◽  
M.A. Timofeyev ◽  
...  
Keyword(s):  
Glow Discharge ◽  
Chemical Vapour Deposition ◽  
Diamond Film ◽  
Vapour Deposition ◽  
Discharge Plasma ◽  
Chemical Vapour ◽  
Film Deposition ◽  
Glow Discharge Plasma ◽  
Plasma Chemical ◽  
Plasma Chemical Vapour Deposition

Diamond film growth by pulse-modulated magnetoactive microwave plasma chemical vapour deposition

1996 ◽  
Vol 281-282 ◽  
pp. 264-266 ◽  
Author(s):  
Akimitsu Hatta ◽  
Hidetoshi Suzuki ◽  
Ken-ichi Kadota ◽  
Toshimichi Ito ◽  
Akio Hiraki
Keyword(s):  
Chemical Vapour Deposition ◽  
Diamond Film ◽  
Vapour Deposition ◽  
Film Growth ◽  
Microwave Plasma ◽  
Chemical Vapour ◽  
Plasma Chemical ◽  
Plasma Chemical Vapour Deposition ◽  
Diamond Film Growth

Direct-current hollow-cathode glow-discharge plasma-enhanced-chemical-vapour-deposition technique for a-Si:H thin-film production

1985 ◽  
Vol 63 (6) ◽  
pp. 826-830 ◽  
Author(s):  
S. Matsumura ◽  
K. Sakurai ◽  
A. A. Berezin ◽  
R. M. Hobson ◽  
S. Teii ◽  
...  
Keyword(s):  
Glow Discharge ◽  
Deposition Rate ◽  
Chemical Vapour Deposition ◽  
Direct Current ◽  
Hollow Cathode ◽  
Vapour Deposition ◽  
Discharge Plasma ◽  
Chemical Vapour ◽  
Glow Discharge Plasma ◽  
Rf Discharge

The direct-current hollow-cathode glow-discharge plasma-enhanced-chemical-vapour-deposition (PCVD) technique has been developed for the production of a-Si:H thin films. The electric conductivity, deposition rate, and optical characteristics of films produced by this method are similar to those of films produced by the conventional RF-discharge PCVD method. However, the properties of the former can be easily controlled by the discharge current without external substrate heating. The power consumption per deposition rate is much smaller than the microwave methods; but similar to that which is characteristic of RF-discharge methods.

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