Plasmonic waves of graphene on a conducting substrate

2018 ◽  
Vol 66 (3) ◽  
pp. 353-357 ◽  
Author(s):  
Afshin Moradi
Keyword(s):  
2013 ◽  
Vol 13 (5) ◽  
pp. 3307-3312 ◽  
Author(s):  
Tae-Eon Kim ◽  
Jin Chul Bae ◽  
Kwang Yeon Cho ◽  
Yong-Gun Shul ◽  
Chang Yeoul Kim

2011 ◽  
Vol 3 (6) ◽  
pp. 1852-1858 ◽  
Author(s):  
Aiming Mao ◽  
Kahee Shin ◽  
Jung Kyu Kim ◽  
Dong Hwan Wang ◽  
Gui Young Han ◽  
...  

2019 ◽  
Vol 61 (10) ◽  
pp. 1683-1689
Author(s):  
D. S. Il’yushchenkov ◽  
V. M. Kozhevin ◽  
S. A. Gurevich

ChemPhysChem ◽  
2009 ◽  
Vol 10 (7) ◽  
pp. 1053-1057 ◽  
Author(s):  
Achraf Ghorbal ◽  
Federico Grisotto ◽  
Julienne Charlier ◽  
Serge Palacin ◽  
Cédric Goyer ◽  
...  

ChemPhysChem ◽  
2015 ◽  
Vol 16 (18) ◽  
pp. 3774-3778 ◽  
Author(s):  
Ping Du ◽  
David Kreher ◽  
Fabrice Mathevet ◽  
Pascale Maldivi ◽  
Fabrice Charra ◽  
...  

2012 ◽  
Vol 488-489 ◽  
pp. 1358-1362
Author(s):  
Siti Alwani Binti Ab. Aziz ◽  
Shahrin Hisham Amirnordin ◽  
Ab. Rahman Hamimah ◽  
Hasan Zuhudi Abdullah ◽  
Hariati Taib

The application of electrophoretic deposition (EPD) technique for deposition of thick and thin film deposition has been extended not only on to electrically conducting materials but also to non-conducting material. The review encompasses the fundamental aspects of EPD technique and specific factors influencing the EPD process on non-conducting substrate. Important EPD processing parameters, during EPD on non-conducting substrate discussed are types of substrate, counter-electrode substrate and substrate additive. The parameters were discussed based on the up-to-date comprehensive overview of the current research progress in the field of EPD on non-conducting material.


Sign in / Sign up

Export Citation Format

Share Document