Chemical synthesis and surface morphology of amorphous hydrogenated carbon nitride film deposited by N2/CH4dielectric barrier discharge plasma

Composite Interfaces ◽

10.1080/15685543.2012.699751 ◽

2012 ◽

Vol 19 (3-4) ◽

pp. 161-170 ◽

Author(s):

Abhijit Majumdar ◽

Sadhan Chandra Das ◽

T. Shripathi ◽

Rainer Hippler

Keyword(s):

Surface Morphology ◽

Chemical Synthesis ◽

Carbon Nitride ◽

Discharge Plasma ◽

Barrier Discharge ◽

Nitride Film ◽

Barrier Discharge Plasma ◽

Carbon Nitride Film ◽

Amorphous Hydrogenated Carbon

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Cancer cells (MCF-7, Colo-357, and LNCaP) viability on amorphous hydrogenated carbon nitride film deposited by dielectric barrier discharge plasma

Journal of Applied Physics ◽

10.1063/1.3190558 ◽

2009 ◽

Vol 106 (3) ◽

pp. 034702 ◽

Author(s):

Abhijit Majumdar ◽

Ramesh Ummanni ◽

Karsten Schröder ◽

Reinhard Walther ◽

Rainer Hippler

Keyword(s):

Carbon Nitride ◽

Discharge Plasma ◽

Barrier Discharge ◽

Nitride Film ◽

Dielectric Barrier Discharge Plasma ◽

Dielectric Barrier ◽

Barrier Discharge Plasma ◽

Carbon Nitride Film ◽

Amorphous Hydrogenated Carbon ◽

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Structural characterization of amorphous hydrogenated-carbon nitride (aH-CNx) film deposited by CH4/N2 dielectric barrier discharge plasma: 13C, 1H solid state NMR, FTIR and elemental analysis

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2009.01.038 ◽

2009 ◽

Vol 203 (14) ◽

pp. 2013-2016 ◽

Author(s):

Abhijit Majumdar ◽

Gudrun Scholz ◽

Rainer Hippler

Keyword(s):

Solid State ◽

Solid State Nmr ◽

Carbon Nitride ◽

Discharge Plasma ◽

Barrier Discharge ◽

Dielectric Barrier Discharge Plasma ◽

Dielectric Barrier ◽

Barrier Discharge Plasma ◽

Amorphous Hydrogenated Carbon

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Influence of a Magnetic Field on High voltage Discharge Plasma Area for Carbon Nitride Film Deposition

Journal of the Korean Institute of Electrical and Electronic Material Engineers ◽

10.4313/jkem.2002.15.2.184 ◽

2002 ◽

Vol 15 (2) ◽

pp. 184-189

Keyword(s):

Magnetic Field ◽

High Voltage ◽

Carbon Nitride ◽

Discharge Plasma ◽

Film Deposition ◽

Nitride Film ◽

Carbon Nitride Film ◽

High Voltage Discharge

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Effect of a Laser Ablation on High Voltage Discharge Plasma Area for Carbon Nitride Film Deposition

Journal of the Korean Institute of Electrical and Electronic Material Engineers ◽

10.4313/jkem.2002.15.6.551 ◽

2002 ◽

Vol 15 (6) ◽

pp. 551-557

Keyword(s):

Laser Ablation ◽

High Voltage ◽

Carbon Nitride ◽

Discharge Plasma ◽

Film Deposition ◽

Nitride Film ◽

Carbon Nitride Film ◽

High Voltage Discharge

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The chemical composition and bonding structure of amorphous hydrogenated carbon nitride film on aluminum surface deposited by electrodeposition

Surface and Interface Analysis ◽

10.1002/sia.3640 ◽

2011 ◽

Vol 43 (4) ◽

pp. 823-826 ◽

Author(s):

Yuanlie Yu ◽

Junyan Zhang

Keyword(s):

Chemical Composition ◽

Carbon Nitride ◽

Aluminum Surface ◽

Nitride Film ◽

Bonding Structure ◽

Carbon Nitride Film ◽

Amorphous Hydrogenated Carbon

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Infrared optical properties of amorphous hydrogenated carbon nitride film

Journal of Non-Crystalline Solids ◽

10.1016/s0022-3093(00)00324-0 ◽

2000 ◽

Vol 278 (1-3) ◽

pp. 213-217 ◽

Author(s):

Jianhua Ju ◽

Yiben Xia ◽

Weli Zhang ◽

Linjun Wang ◽

Dingyuan Tang

Keyword(s):

Optical Properties ◽

Carbon Nitride ◽

Nitride Film ◽

Carbon Nitride Film ◽

Amorphous Hydrogenated Carbon ◽

Infrared Optical Properties

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Deposition of functional hydrogenated amorphous carbon-nitride film (a-CN:H) using C2H4/N2townsend dielectric barrier discharge

The European Physical Journal Applied Physics ◽

10.1051/epjap/2009079 ◽

2009 ◽

Vol 47 (2) ◽

pp. 22820 ◽

Author(s):

C. Sarra-Bournet ◽

N. Gherardi ◽

S. Turgeon ◽

G. Laroche ◽

F. Massines

Keyword(s):

Dielectric Barrier Discharge ◽

Amorphous Carbon ◽

Carbon Nitride ◽

Barrier Discharge ◽

Nitride Film ◽

Dielectric Barrier ◽

Hydrogenated Amorphous Carbon ◽

Carbon Nitride Film ◽

Amorphous Carbon Nitride ◽

Hydrogenated Amorphous

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Surface morphology stabilization by chemical sputtering in carbon nitride film growth

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/41/1/012006 ◽

2007 ◽

Vol 41 (1) ◽

pp. 012006 ◽

Author(s):

J G Buijnsters ◽

L Vázquez

Keyword(s):

Surface Morphology ◽

Carbon Nitride ◽

Film Growth ◽

Nitride Film ◽

Chemical Sputtering ◽

Carbon Nitride Film

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Improvement of Tear Strength using Dielectric Barrier Discharge Plasma

IEEJ Transactions on Fundamentals and Materials ◽

10.1541/ieejfms.129.403 ◽

2009 ◽

Vol 129 (6) ◽

pp. 403-408

Author(s):

Tsubasa Nakamura ◽

Seizo Furuya ◽

Nobuhiro Harada

Keyword(s):

Dielectric Barrier Discharge ◽

Discharge Plasma ◽

Barrier Discharge ◽

Dielectric Barrier Discharge Plasma ◽

Dielectric Barrier ◽

Tear Strength ◽

Barrier Discharge Plasma

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Characteristic of Silver\ Polyaniline Nanocomposite Thin Films Prepared by Aerosol Assisted Dielectric Barrier Discharge Plasma Jet Polymerization

Asian Journal of Applied Science and Engineering ◽

10.15590/ajase/2014/v3i8/54481 ◽

2014 ◽

Vol 3 (8) ◽

pp. 25 ◽

Author(s):

Hammad R. Humud ◽

Ahmad Kudhair Abass ◽

Zahraa Wheeb

Keyword(s):

Dielectric Barrier Discharge ◽

Discharge Plasma ◽

Barrier Discharge ◽

Dielectric Barrier Discharge Plasma ◽

Dielectric Barrier ◽

Nanocomposite Thin Films ◽

Barrier Discharge Plasma ◽

Polyaniline Nanocomposite

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