A CHEMICAL AMPLIFICATION SYSTEM FOR CONDUCTIOMETRIC MONITORING OF AIRBORNE CO2PARTIAL PRESSURES

2000 ◽  
Vol 28 (4) ◽  
pp. 269-280 ◽  
Author(s):  
James E. Atwater ◽  
Jeffrey L. DeHart ◽  
James R. Akse
Keyword(s):  
Chemical Amplification ◽  
Amplification System

Novel Chemical Amplification System in Azide/Phenolic Resin-Based Negative Resist

1989 ◽  
Author(s):  
Emiko Aoki ◽  
Hiroshi Shiraishi ◽  
Michiaki Hashimoto ◽  
Nobuaki Hayashi
Keyword(s):  
Phenolic Resin ◽  
Chemical Amplification ◽  
Amplification System

scholarly journals Application of silylether and silylester polymer for chemical amplification system.

1990 ◽  
Vol 3 (3) ◽  
pp. 389-400 ◽  
Author(s):  
Toshiaki Aoai ◽  
Yoshimasa Aotani ◽  
Akira Umehara ◽  
Tadayoshi Kokubo
Keyword(s):  
Chemical Amplification ◽  
Amplification System

Anticoagulant Properties of Three Mucopolysaccharides Used in Rheumatology

1983 ◽  
Vol 50 (03) ◽  
pp. 652-655 ◽  
Author(s):  
F Bauer ◽  
P Schulz ◽  
G Reber ◽  
C A Bouvier
Keyword(s):  
Factor Xa ◽  
Degenerative Joint Disease ◽  
Joint Disease ◽  
Thrombin Time ◽  
Coagulation Tests ◽  
Amplification System ◽  
Relative Potencies ◽  
In Vivo Administration

SummaryThree mucopolysaccharides (MPS) used in the treatment of degenerative joint disease were compared to heparin to establish their relative potencies on 3 coagulation tests, the aPTT, the antifactor X a activity and the dilute thrombin time. One of the compounds, Arteparon®, was one fourth as potent as heparin on the aPTT, but had little or no influence on the 2 other tests. Further in vitro studies suggested that Arteparon® acted at a higher level than factor Xa generation in the intrinsic amplification system and that its effect was independent of antithrombin III. In vivo administration of Arteparon® confirmed its anticoagulant properties, which raises the question of the clinical use of this MPS.

scholarly journals Environmentally stable chemical amplification positive resist: principle, chemistry, contamination resistance, and lithographic feasibility.

1994 ◽  
Vol 7 (3) ◽  
pp. 433-447 ◽  
Author(s):  
Hiroshi ITO ◽  
Greg BREYTA ◽  
Don HOFER ◽  
R. SOORIYAKUMARAN ◽  
Karen PETRILLO ◽  
...  
Keyword(s):  
Chemical Amplification ◽  
Stable Chemical ◽  
Positive Resist

Chemical amplification & dissolution inhibition: a novel high performance positive tone deep UV resist.

1992 ◽  
Vol 5 (1) ◽  
pp. 55-66 ◽  
Author(s):  
GEORG PAWLOWSKI ◽  
KLAUS-JÜRGEN PRZYBILLA ◽  
WALTER SPIESS ◽  
HORST WENGENROTH ◽  
HORST RÖSCHERT
Keyword(s):  
High Performance ◽  
Chemical Amplification ◽  
Deep Uv

Picosecond laser amplification system with 93W high average power

2008 ◽  
Vol 281 (10) ◽  
pp. 2879-2882 ◽  
Author(s):  
Runwu Peng ◽  
Lin Guo ◽  
Xiaofu Zhang ◽  
Fangqin Li ◽  
Qianjin Cui ◽  
...  
Keyword(s):  
Average Power ◽  
Picosecond Laser ◽  
High Average Power ◽  
Laser Amplification ◽  
Amplification System
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