The influence of rf power and oxygen flow rate during deposition on the optical transmittance of copper oxide thin films prepared by reactive magnetron sputtering
2005 ◽
Vol 38
(2)
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pp. 266-271
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Keyword(s):
2017 ◽
Vol 211
◽
pp. 012025
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2015 ◽
Vol 90
(2)
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pp. 219-224
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2016 ◽
Vol 675-676
◽
pp. 217-220
2014 ◽
Vol 979
◽
pp. 448-451
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2005 ◽
Vol 53
(19)
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pp. 5151-5159
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2017 ◽
Vol 4
(5)
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pp. 6218-6223
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Keyword(s):
2007 ◽
Vol 124-126
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pp. 999-1002
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2021 ◽