Tuning the Structural and Optoelectronic Properties of Sub-stoichiometric Molybdenum Trioxide (MoOx, x < 3) Thin Films through the Oxygen Flow During the Reactive Magnetron Sputtering Deposition

2021 ◽  
Author(s):  
Brahim Aissa ◽  
Atef Zekri ◽  
Yahya Zakaria ◽  
Ayman Samara ◽  
Cedric Broussillou
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Molybdenum Trioxide ◽  
Optoelectronic Properties ◽  
Reactive Magnetron Sputtering ◽  
Oxygen Flow ◽  
Reactive Magnetron ◽  
Sputtering Deposition ◽  
Structural And Optoelectronic Properties

Optoelectronic properties of Cu3N thin films deposited by reactive magnetron sputtering and its diode rectification characteristics

2019 ◽  
Vol 789 ◽  
pp. 428-434 ◽  
Author(s):  
Sheng-Chi Chen ◽  
Sin-Yi Huang ◽  
Shikha Sakalley ◽  
Abhyuday Paliwal ◽  
Yin-Hung Chen ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Optoelectronic Properties ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron

PROPERTIES OF Ta2O5 THIN FILMS DEPOSITED BY DC REACTIVE MAGNETRON SPUTTERING

2009 ◽  
Vol 23 (27) ◽  
pp. 5275-5282 ◽  
Author(s):  
JICHENG ZHOU ◽  
DITIAN LUO ◽  
YOUZHEN LI ◽  
ZHENG LIU
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Surface Characteristics ◽  
Reactive Magnetron Sputtering ◽  
Oxygen Flow ◽  
Root Mean Square Roughness ◽  
Reactive Magnetron ◽  
Flow Ratio ◽  
Dc Reactive Magnetron Sputtering ◽  
Xrd Patterns

Ta 2 O 5 thin films were deposited at different oxygen flow ratio ( O 2/( O 2+Ar) = 10 ~ 80%) by DC reactive magnetron sputtering. Influence of oxygen flow ratio on depositing rate, surface characteristics, microstructure, and optical properties are discussed in this paper. With the increasing of oxygen, deposition rate decreases exponentially, the root mean square roughness and the maximum roughness decrease according to the atom force microscope images. XRD patterns indicate the as-deposited Ta 2 O 5 films are amorphous. Based on the envelop method, the samples' optical constants are calculated from the curve of transmission spectrum. The results indicate that refractive index n increases from 2.01 to 2.20 (λ = 500 nm ) for the oxygen flow ratio increases from 20% to 60%, the extinction coefficient k appears to decrease.

Structural Changes of Titanium Dioxide Thin Films Deposited by Reactive Magnetron Sputtering through Nitrogen Incorporation

2016 ◽  
Vol 683 ◽  
pp. 383-388 ◽  
Author(s):  
Alla Pustovalova ◽  
Nina Ivanova
Keyword(s):  
Thin Films ◽  
Titanium Dioxide ◽  
Magnetron Sputtering ◽  
Structural Changes ◽  
Nitrogen Concentration ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Sputtering Deposition ◽  
Titanium Dioxide Thin Films ◽  
Nitrogen Doped Titanium Dioxide

This paper presents the results of the studies of the structure and chemical composition of nitrogen-doped titanium dioxide thin films obtained by reactive magnetron sputtering deposition. The XRD data show the changes of the structure and phase composition of titanium dioxide thin films due to the nitrogen doping. The change of the films structure increases with the growth of the nitrogen content. The reduction of crystallites size takes place at the increase of the nitrogen concentration. Chemical bonds present in the films were examined by FTIR spectroscopy.

Deposition of Transparent Niobium Oxide Thin Film by DC Reactive Magnetron Sputtering

2016 ◽  
Vol 675-676 ◽  
pp. 217-220
Author(s):  
Narong Sangwaranatee ◽  
Mati Horprathum ◽  
Jakrapong Kaewkhao
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Deposition Rate ◽  
Flow Rate ◽  
Niobium Oxide ◽  
Oxygen Flow Rate ◽  
Reactive Magnetron Sputtering ◽  
Oxygen Flow ◽  
Reactive Magnetron ◽  
Dc Reactive Magnetron Sputtering

Transparent niobium oxide thin films were prepared by dc reactive magnetron sputtering under different oxygen flow rate. The niobium oxide thin films have been deposited on silicon wafer and glass substrate from a 99.99% pure niobium target at room temperature. The films were characterized to obtain the relationship between oxygen flow rate and deposition rate, structural, morphology and optical. The result show that the deposition rate decreased with increasing the oxygen flow rate. However, the transmittance spectrum percentage increases with increasing the oxygen flow rate.

Effect of O2 Flow Rate on Structural and Optical Properties of Tantalum Oxide Thin Films Prepared by DC Reactive Magnetron Sputtering

2014 ◽  
Vol 979 ◽  
pp. 448-451 ◽  
Author(s):  
Narong Sangwaranatee ◽  
Mati Horprathum ◽  
Jakrapong Kaewkhao
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Flow Rate ◽  
Tantalum Oxide ◽  
Oxygen Flow Rate ◽  
Reactive Magnetron Sputtering ◽  
Oxygen Flow ◽  
Reactive Magnetron ◽  
Dc Reactive Magnetron Sputtering

Tantalum oxide (Ta2O5) thin films have been deposited on glass substrates and silicon wafers (100) by dc reactive magnetron sputtering and with a 99.995% pure tantalum target. The effect of the oxygen flow rate on the crystallinity and optical properties were investigated. The films were characterized by X-ray diffraction patterns, UV-Vis spectrophotometer and spectroscopic ellipsometry. The results show that the deposition rate of Ta2O5 thin films was decreased with the increase in oxygen flow rate. In addition, Ta2O5 thin films deposited at oxygen flow rate higher than 6 sccm could be exhibited sufficiently oxide thin film, the transmittance spectrum percentage indicated 80%, which corresponded to the obtained optical characteristic.

Sign in / Sign up

Export Citation Format

Share Document