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Improvements of Interfacial and Electrical Properties for Ge MOS Capacitor with LaTaON Gate Dielectric by Optimizing Ta Content
Chinese Physics Letters
◽
10.1088/0256-307x/35/7/077302
◽
2018
◽
Vol 35
(7)
◽
pp. 077302
◽
Cited By ~ 1
Author(s):
Xu Bin
◽
Jing-Ping Xu
◽
Lu Liu
◽
Yong Su
Keyword(s):
Electrical Properties
◽
Gate Dielectric
◽
Mos Capacitor
Download Full-text
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References
Improved interfacial and electrical properties of HfLaON gate dielectric Ge MOS capacitor by NbON/Si dual passivation layer and fluorine incorporation
Applied Physics Letters
◽
10.1063/1.4967186
◽
2016
◽
Vol 109
(19)
◽
pp. 193504
◽
Cited By ~ 6
Author(s):
Yong Huang
◽
Jing-Ping Xu
◽
Lu Liu
◽
Pui-To Lai
◽
Wing-Man Tang
Keyword(s):
Electrical Properties
◽
Gate Dielectric
◽
Passivation Layer
◽
Mos Capacitor
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Effects of fluorine incorporation on the electrical properties of silicon MOS capacitor with La2O3 gate dielectric
2011 IEEE International Conference of Electron Devices and Solid-State Circuits
◽
10.1109/edssc.2011.6117657
◽
2011
◽
Author(s):
L. X. Qian
◽
X. D. Huang
◽
P. T. Lai
Keyword(s):
Electrical Properties
◽
Gate Dielectric
◽
Mos Capacitor
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Improved interfacial and electrical properties of Ge MOS capacitor with ZrON/TaON multilayer composite gate dielectric by using fluorinated Si passivation layer
Applied Physics Letters
◽
10.1063/1.4996722
◽
2017
◽
Vol 111
(5)
◽
pp. 053501
◽
Cited By ~ 3
Author(s):
Yong Huang
◽
Jing-Ping Xu
◽
Lu Liu
◽
Zhi-Xiang Cheng
◽
Pui-To Lai
◽
...
Keyword(s):
Electrical Properties
◽
Gate Dielectric
◽
Passivation Layer
◽
Multilayer Composite
◽
Mos Capacitor
Download Full-text
Improved Interfacial and Electrical Properties of GaAs MOS Capacitor With LaON/TiON Multilayer Composite Gate Dielectric and LaON as Interfacial Passivation Layer
IEEE Transactions on Electron Devices
◽
10.1109/ted.2017.2667041
◽
2017
◽
Vol 64
(4)
◽
pp. 1535-1540
◽
Cited By ~ 9
Author(s):
Han-Han Lu
◽
Lu Liu
◽
Jing-Ping Xu
◽
Pui-To Lai
◽
Wing-Man Tang
Keyword(s):
Electrical Properties
◽
Gate Dielectric
◽
Passivation Layer
◽
Multilayer Composite
◽
Mos Capacitor
Download Full-text
Varying sputtering ambient and annealing gas to optimize the electrical properties of MOS capacitor with HfLaO gate dielectric
2010 IEEE International Conference of Electron Devices and Solid-State Circuits (EDSSC)
◽
10.1109/edssc.2010.5713772
◽
2010
◽
Author(s):
Q B Tao
◽
P T Lai
Keyword(s):
Electrical Properties
◽
Gate Dielectric
◽
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Temperature dependence of electrical properties for MOS capacitor with HfO2/SiO2 gate dielectric stack
Materials Science in Semiconductor Processing
◽
10.1016/j.mssp.2012.09.013
◽
2013
◽
Vol 16
(5)
◽
pp. 1321-1327
◽
Cited By ~ 18
Author(s):
T. Yu
◽
C.G. Jin
◽
Y.J. Dong
◽
D. Cao
◽
L.J. Zhuge
◽
...
Keyword(s):
Electrical Properties
◽
Temperature Dependence
◽
Gate Dielectric
◽
Mos Capacitor
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Improved interfacial and electrical properties of HfTiON gate-dielectric Ge MOS capacitor by using LaON/Si dual passivation layer and fluorine-plasma treatment
Applied Surface Science
◽
10.1016/j.apsusc.2019.07.055
◽
2019
◽
Vol 493
◽
pp. 628-633
Author(s):
Yong Huang
◽
Jing-Ping Xu
◽
Lu Liu
◽
Zhi-Xiang Cheng
◽
Pui-To Lai
◽
...
Keyword(s):
Electrical Properties
◽
Plasma Treatment
◽
Gate Dielectric
◽
Passivation Layer
◽
Mos Capacitor
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Electrical properties of LaTiO high-k gate dielectric Ge MOS Capacitor and Ti content optimization
Acta Physica Sinica
◽
10.7498/aps.65.037301
◽
2016
◽
Vol 65
(3)
◽
pp. 037301
Author(s):
Xu Huo-Xi
◽
Xu Jing-Ping
Keyword(s):
Electrical Properties
◽
Gate Dielectric
◽
Mos Capacitor
◽
High K
◽
Ti Content
◽
Content Optimization
◽
High K Gate Dielectric
Download Full-text
Thermal stability and electrical properties of Zr silicate films for high-k gate-dielectric applications, as prepared by pulsed laser deposition
Applied Physics A
◽
10.1007/s00339-003-2187-4
◽
2005
◽
Vol 80
(2)
◽
pp. 321-324
◽
Cited By ~ 7
Author(s):
J. Zhu
◽
Z.G. Liu
◽
M. Zhu
◽
G.L. Yuan
◽
J.M. Liu
Keyword(s):
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◽
Electrical Properties
◽
Pulsed Laser Deposition
◽
Gate Dielectric
◽
Pulsed Laser
◽
Laser Deposition
◽
High K
◽
High K Gate Dielectric
Download Full-text
Electrical properties of 1.5-nm SiON gate-dielectric using radical oxygen and radical nitrogen
IEEE Transactions on Electron Devices
◽
10.1109/ted.2002.804695
◽
2002
◽
Vol 49
(11)
◽
pp. 1903-1909
◽
Cited By ~ 8
Author(s):
M. Togo
◽
K. Watanabe
◽
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◽
N. Ikarashi
◽
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◽
...
Keyword(s):
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Gate Dielectric
Download Full-text
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