It is generally known that the p-type AlGaN electron-blocking layer (EBL) can hinder hole injection for near-ultraviolet light-emitting diodes (NUV-LEDs). Moreover, at the last quantum barrier (LQB)/EBL interface, the polarization-induced...
We describe CVD of nickel oxide (NiO) thin films using a new precursor [Ni(dmamp′)2], synthesised using a readily commercially available dialkylaminoalkoxide ligand (dmamp′), which is applied to synthesis of a hole transport-electron blocking layer.