Correlation between electrical conductivity—optical band gap energy and precursor molarities ultrasonic spray deposition of ZnO thin films

2013 ◽  
Vol 34 (11) ◽  
pp. 113001 ◽  
Author(s):  
Said Benramache ◽  
Okba Belahssen ◽  
Abderrazak Guettaf ◽  
Ali Arif
2019 ◽  
Vol 18 (01) ◽  
pp. 1850013 ◽  
Author(s):  
Maryam Motallebi Aghgonbad ◽  
Hassan Sedghi

In the present work, pure and Fe-doped ZnO thin films were deposited on glass substrates by sol–gel method. Zinc acetate and iron nitrate were used as the starting material and dopant source, respectively. The concentration of Fe doping was 6[Formula: see text]at.% and 8[Formula: see text]at.%. The optical and electronic properties of pure and Fe-doped ZnO thin films such as refraction index, extinction coefficient, dielectric function and optical band gap energy of the layers were obtained by spectroscopic ellipsometry method in the wavelength range of 300–900[Formula: see text]nm. The incidence angle of the layers kept 70[Formula: see text]. Also data obtained by Kramers–Kronig relations were used for comparison. The influence of Fe-doping concentration on the optical and electronic properties of thin films was studied. The transmittance data of ZnO thin films showed that 6[Formula: see text]at.% Fe-doped ZnO thin film has the highest transmittance value. Dielectric function of pure ZnO films was found to be higher compared with Fe-doped ones. Also it can be deduced from the results that Fe doping influences the optical band gap energy of thin films.


2015 ◽  
Vol 7 (3) ◽  
pp. 1923-1930
Author(s):  
Austine Amukayia Mulama ◽  
Julius Mwakondo Mwabora ◽  
Andrew Odhiambo Oduor ◽  
Cosmas Mulwa Muiva ◽  
Boniface Muthoka ◽  
...  

 Selenium-based chalcogenides are useful in telecommunication devices like infrared optics and threshold switching devices. The investigated system of Ge5Se95-xZnx (0.0 ≤ x ≤ 4 at.%) has been prepared from high purity constituent elements. Thin films from the bulk material were deposited by vacuum thermal evaporation. Optical absorbance measurements have been performed on the as-deposited thin films using transmission spectra. The allowed optical transition was found to be indirect and the corresponding band gap energy determined. The variation of optical band gap energy with the average coordination number has also been investigated based on the chemical bonding between the constituents and the rigidity behaviour of the system’s network.


2013 ◽  
Vol 37 (1) ◽  
pp. 83-91 ◽  
Author(s):  
Chitra Das ◽  
Jahanara Begum ◽  
Tahmina Begum ◽  
Shamima Choudhury

Effect of thickness on the optical and electrical properties of gallium arsenide (GaAs) thin films were studied. The films of different thicknesses were prepared by vacuum evaporation method (~10-4 Pa) on glass substrates at a substrate temperature of 323 K. The film thickness was measured in situ by a frequency shift of quartz crystal. The thicknesses were 250, 300 and 500 nm. Absorption spectrum of this thin film had been recorded using UV-VIS-NIR spectrophotometer in the photon wavelength range of 300 - 2500 nm. The values of some important optical parameters of the studied films (absorption coefficient, optical band gap energy and refractive index; extinction co-efficient and real and imaginary parts of dielectric constant) were determined using these spectra. Transmittance peak was observed in the visible region of the solar spectrum. Here transmittance showed better result when thicknesses were being increased. The optical band gap energy was decreased by the increase of thickness. The refractive index increased by increasing thickness while extinction co-efficient and real and imaginary part of dielectric constant decreased. DOI: http://dx.doi.org/10.3329/jbas.v37i1.15684 Journal of Bangladesh Academy of Sciences, Vol. 37, No. 1, 83-91, 2013


2014 ◽  
Vol 14 (3) ◽  
pp. 421-427 ◽  
Author(s):  
Deuk Yong Lee ◽  
Ju-Hyun Park ◽  
Young-Hun Kim ◽  
Myung-Hyun Lee ◽  
Nam-Ihn Cho

2012 ◽  
Vol 616-618 ◽  
pp. 1773-1777
Author(s):  
Xi Lian Sun ◽  
Hong Tao Cao

In depositing nitrogen doped tungsten oxide thin films by using reactive dc pulsed magnetron sputtering process, nitrous oxide gas (N2O) was employed instead of nitrogen (N2) as the nitrogen dopant source. The nitrogen doping effect on the structural and optical properties of WO3 thin films was investigated by X-ray diffraction, transmission electron microscopy and UV-Vis spectroscopy. The thickness, refractive index and optical band gap energy of these films have been determined by analyzing the SE spectra using parameterized dispersion model. Morphological images reveal that the films are characterized by a hybrid structure comprising nanoparticles embeded in amorphous matrix and open channels between the agglomerated nanoparticles. Increasing nitrogen doping concentration is found to decrease the optical band gap energy and the refractive index. The reduced band gaps are associated with the N 2p orbital in the N-doped tungsten oxide films.


2013 ◽  
Vol 13 (7) ◽  
pp. 1301-1305 ◽  
Author(s):  
Deuk Yong Lee ◽  
Jin-Tae Kim ◽  
Ju-Hyun Park ◽  
Young-Hun Kim ◽  
In-Kyu Lee ◽  
...  

2005 ◽  
Vol 22 (7) ◽  
pp. 1787-1789 ◽  
Author(s):  
Tian Guang-Lei ◽  
He Hong-Bo ◽  
Shao Jian-Da

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