Comparing the methods of copper substrate polishing for CVD graphene synthesis
2021 ◽
Vol 2057
(1)
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pp. 012121
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Abstract This paper presents a comparison of chemical and plasma electrolyte polishing methods for preparing a copper substrate for graphene synthesis by chemical vapour deposition. It is shown that in order to achieve the most uniform morphology of the surface of the copper substrate, it is preferable to use the electrolyte-plasma polishing method. With its help, the proportion of multilayer regions in the graphene coating obtained as a result of CVD synthesis decreases. The obtained results may serve a recommendation for creating a graphene coating with specified parameters.
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2018 ◽
Vol 10
(7)
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pp. 760-763
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2002 ◽
Vol 82
(1)
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pp. 137-165
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1999 ◽
Vol 09
(PR8)
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pp. Pr8-395-Pr8-402
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