A mechanism for crystal twinning in the growth of diamond by chemical vapour deposition

Author(s):  
James E Butler ◽  
Ivan Oleynik

A model for the formation of crystal twins in chemical vapour deposited diamond materials is presented. The twinning mechanism originates from the formation of a hydrogen-terminated four carbon atom cluster on a local {111} surface morphology, which also serves as a nucleus to the next layer of growth. Subsequent growth proceeds by reaction at the step edges with one and two carbon atom-containing species. The model also provides an explanation for the high defect concentration observed in 〈111〉 growth sectors, the formation of penetration and contact twins, and the dramatic enhancement in polycrystalline diamond growth rates and morphology changes when small amounts of nitrogen are added to the plasma-assisted growth environments.

Growth of diamond at conditions where it is the metastable phase can be achieved by various chemical vapour deposition methods. Atomic hydrogen plays a major role in mediating rates and in maintaining a proper surface for growth. Low molecular weight hydrocarbon species (e.g. CH 3 and C 2 H x are believed to be responsible for extension of the diamond lattice, but complete understanding of attachment mechanisms has not yet been achieved. The nucleation of diamond crystals directly from the gas phase can proceed through a graphitic intermediate. Once formed, the growth rate of diamond crystals is enhanced by the influence of stacking errors. Many of the commonly observed morphologies, e.g. hexagonal platelets and (apparent) decahedral and icosahedral crystals, can be explained by the influence of simple stacking errors on growth rates. In situ measurements of growth rates as a function of hydrocarbon concentration show that the mechanism for diamond growth is complex and may involve surface adsorption processes in rate limiting steps. The transport régime in diamond deposition reactors varies widely. In the hot-filament and microwave reactors, which operate from 20 to 100 Torr (1 Torr ≈ 133 Pa), the transport of mass and energy is dominated by molecular diffusion. In the atmospheric pressure combustion and plasma methods, transport is dominated by convection. In situ measurements of H atom recombination rates in hot-filament reactors show that, under many commonly used process conditions, transport of atomic hydrogen to the growing surface is diffusion limited and H atom recombination is a major contributor to energy transport.


2011 ◽  
Vol 20 (12) ◽  
pp. 126801
Author(s):  
Wei-Xuan Hu ◽  
Bu-Wen Cheng ◽  
Chun-Lai Xue ◽  
Shao-Jian Su ◽  
Qi-Ming Wang

2009 ◽  
Vol 21 (36) ◽  
pp. 364203 ◽  
Author(s):  
Paul W May ◽  
Neil L Allan ◽  
Michael N R Ashfold ◽  
James C Richley ◽  
Yuri A Mankelevich

1996 ◽  
Vol 35 (Part 1, No. 1A) ◽  
pp. 216-220 ◽  
Author(s):  
Akira Higa ◽  
Akimitsu Hatta ◽  
Toshimichi Ito ◽  
Minoru Toguchi ◽  
Akio Hiraki

2010 ◽  
Vol 43 (37) ◽  
pp. 374017 ◽  
Author(s):  
J J Gracio ◽  
Q H Fan ◽  
J C Madaleno

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