Optical centres related to nitrogen, vacancies and interstitials in polycrystalline diamond films grown by plasma-assisted chemical vapour deposition

This study analyses residual stress measurement using X-Ray diffraction method on ultrafine-polycrystalline diamonds and polycrystalline diamonds films grown using Hot Filament Chemical Vapour Deposition technique (HFCVD) on silicon nitride(Si3N4) and tungsten carbide (WC) substrates in the same chamber at the same time with varied pretreatments prior to HFCVD diamond deposition. Measurements were taken perpendicular to the surface and the measured residual stress states of the diamond films are in compression. Thus, assuming isotropic properties of the film, the diamond films grown have tension residual stress parallel to the surface of the substrate. Residual stress is estimated to have the lowest stress for substrate that has undergone 5g/liter silicon carbide seeding process. Effects of residual stress to adhesion are discussed for both substrates.

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Hot filament chemical vapour deposition and wear resistance of diamond films on WC-Co substrates coated using PVD-arc deposition technique

Diamond and Related Materials ◽

10.1016/j.diamond.2005.09.045 ◽

2006 ◽

Vol 15 (9) ◽

pp. 1284-1291 ◽

Cited By ~ 36

Author(s):

Riccardo Polini ◽

Fabio Pighetti Mantini ◽

Massimiliano Barletta ◽

Roberta Valle ◽

Fabrizio Casadei

Keyword(s):

Wear Resistance ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Diamond Films ◽

Chemical Vapour ◽

Deposition Technique ◽

Hot Filament ◽

Arc Deposition

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Effect of Hydrogen Plasma Treatment on Implantation Damage in Diamond Films Grown by Chemical Vapour Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.31.l1191 ◽

1992 ◽

Vol 31 (Part 2, No. 8B) ◽

pp. L1191-L1194 ◽

Cited By ~ 8

Author(s):

Yusuke Mori ◽

Masahiro Deguchi ◽

Nobuhiro Eimori ◽

Jing Shing Ma ◽

Kazuhito Nishimura ◽

...

Keyword(s):

Plasma Treatment ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Hydrogen Plasma ◽

Diamond Films ◽

Chemical Vapour ◽

Implantation Damage

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A Comparison of the Surface Properties of DLC and Nanocrystalline Diamond

Key Engineering Materials ◽

10.4028/www.scientific.net/kem.336-338.1776 ◽

2007 ◽

Vol 336-338 ◽

pp. 1776-1779

Author(s):

Chong Mu Lee ◽

Kyung Ha Kim

Keyword(s):

Chemical Vapour Deposition ◽

Amorphous Carbon ◽

Photoelectron Spectroscopy ◽

Vapour Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapour ◽

Scanning Force Microscopy ◽

Nanocrystalline Diamond ◽

Hard Coatings

Diamond-like carbon (DLC) films have been deposited by radio frequency plasma enhanced chemical vapour deposition (rf-PECVD) with different Ar-CH4 mixtures. Nanocrystalline diamond films have been deposited by microwave plasma-enhanced chemical vapour deposition (MPCVD), using Ar-H2-CH4 mixtures. X-ray photoelectron spectroscopy (XPS) and nanotribological investigation (by scanning force microscopy) have been used to compare the mechanical properties and structures of these films. Highly orientated and non-orientated microcrystalline diamond films and MPCVD-produced amorphous carbon have also been studied by way of comparison. The diamond films exhibit a linear relationship between roughness and the coefficient of friction. The DLC and amorphous carbon have higher friction coefficients than the best performing diamond film, but may more easily be deposited as smooth coating. Possible applications for these various carbon-based films include microelectromechanical components, for which smooth, hard coatings are required.

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