Interaction of spin-polarized atoms with a surface studied by optical-reflection spectroscopy

1996 ◽  
Vol 54 (3) ◽  
pp. 2169-2179 ◽  
Author(s):  
Stefan Grafström ◽  
Dieter Suter
2019 ◽  
Vol 8 (4) ◽  
pp. e399-e405 ◽  
Author(s):  
Justin L. Makovicka ◽  
Karan A. Patel ◽  
Jeffrey D. Hassebrock ◽  
David E. Hartigan ◽  
Michael Wong ◽  
...  

1999 ◽  
Vol 83 (7) ◽  
pp. 1311-1314 ◽  
Author(s):  
K. L. Corwin ◽  
S. J. M. Kuppens ◽  
D. Cho ◽  
C. E. Wieman

2007 ◽  
Vol 49 (12) ◽  
pp. 4396-4414 ◽  
Author(s):  
R.A. Castelli ◽  
P.D. Persans ◽  
W. Strohmayer ◽  
V. Parkinson

2021 ◽  
Author(s):  
Kamal Kayed ◽  
Dalal Baba Kurd

Abstract In this article, silicon wafers were thermal treated in air at temperatures from 800 to 1200 °C. The annealed samples were investigated using X-ray diffraction, FTIR and optical reflection spectroscopy. Unique result obtained includes that, that Kubelk-Munk curves could be utilized to estimate the ratio of oxidized silicon atoms. In addition, we found that these curves could provide information on the degree to which the nanoparticle formation affects both the reflection spectra and the energy gap of the Si/SiO2 composites. On the other hand, it has been found that, the intensity of the silicon peak in XRD spectra is proportional to the relative absorption coefficient of amorphous silicon oxide.


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