Intensity oscillations in the inverse photoemission cross section of an unoccupied surface state on Cu(001)

1986 ◽  
Vol 33 (10) ◽  
pp. 7326-7328 ◽  
Author(s):  
S. L. Hulbert ◽  
P. D. Johnson ◽  
R. F. Garrett
1987 ◽  
Vol 35 (8) ◽  
pp. 3728-3733 ◽  
Author(s):  
T. C. Hsieh ◽  
P. John ◽  
T. Miller ◽  
T.-C. Chiang
Keyword(s):  

1984 ◽  
Vol 52 (20) ◽  
pp. 1826-1829 ◽  
Author(s):  
B. Reihl ◽  
R. R. Schlittler ◽  
H. Neff

1985 ◽  
Vol 31 (8) ◽  
pp. 4745-4750 ◽  
Author(s):  
R. A. Bartynski ◽  
T. Gustafsson ◽  
Paul Soven

1984 ◽  
Vol 53 (18) ◽  
pp. 1777-1777 ◽  
Author(s):  
B. Reihl ◽  
R. R. Schlittler ◽  
H. Neff

1977 ◽  
Vol 16 (2) ◽  
pp. 706-710 ◽  
Author(s):  
J. B. Danese ◽  
Paul Soven

2013 ◽  
Vol 2013 ◽  
pp. 1-5 ◽  
Author(s):  
Fu-Chien Chiu

The interfacial properties between silicon and hafnium oxide (HfO2) are explored by the gated-diode method and the subthreshold measurement. The density of interface-trapped charges, the current induced by surface defect centers, the surface recombination velocity, and the surface state capture cross-section are obtained in this work. Among the interfacial properties, the surface state capture cross-section is approximately constant even if the postdeposition annealing condition is changed. This effective capture cross-section of surface states is about 2.4 × 10−15 cm2, which may be an inherent nature in the HfO2/Si interface.


2012 ◽  
Vol 24 (39) ◽  
pp. 395006 ◽  
Author(s):  
Patrizia Borghetti ◽  
Jorge Lobo-Checa ◽  
Elizabeth Goiri ◽  
Aitor Mugarza ◽  
Frederik Schiller ◽  
...  

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