Total dose effects on the shallow-trench isolation leakage current characteristics in a 0.35 μm SiGe BiCMOS technology
1999 ◽
Vol 46
(6)
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pp. 1841-1847
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Keyword(s):
2009 ◽
Vol 56
(4)
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pp. 1941-1949
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2003 ◽
Vol 150
(7)
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pp. G359
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1984 ◽
Vol 31
(6)
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pp. 1358-1363
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Keyword(s):
2014 ◽
Vol 35
(6)
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pp. 064007
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2002 ◽