Seeding High Brightness Fiber Amplifiers With Multi-Phase Coded Signal Modulation for SBS Effect Management

There is great interest in improving the brightness of electron sources and therefore the ability of electron optical instrumentation to probe the properties of materials. Extensive work by Dr. Crew and others has provided extremely high brightness sources for certain kinds of analytical problems but which pose serious difficulties in other problems. These sources cannot survive in conventional system vacuums. If one wishes to gather information from the other signal channels activated by electron beam bombardment it is necessary to provide sufficient current to allow an acceptable signal-to-noise ratio. It is possible through careful design to provide a high brightness field emission source which has the capability of providing high currents as well as high current densities to a specimen. In this paper we describe an electrode to provide long-lived stable current in field emission sources.The source geometry was based upon the results of extensive computer modeling. The design attempted to maximize the total current available at a specimen.

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Some Applications of the U. S. Steel MVEM

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100070461 ◽

1973 ◽

Vol 31 ◽

pp. 4-5

Author(s):

J. S. Lally ◽

L. E. Thomas ◽

R. M. Fisher

Keyword(s):

Electron Diffraction ◽

Debye Temperature ◽

Metals And Alloys ◽

Critical Voltage ◽

Dynamical Diffraction ◽

Phase Structures ◽

Structure Factors ◽

Local Bonding ◽

Diffraction Phenomenon ◽

Multi Phase

A variety of materials containing many different microstructures have been examined with the USS MVEM. Three topics have been selected to illustrate some of the more recent studies of diffraction phenomena and defect, grain and multi-phase structures of metals and minerals.(1) Critical Voltage Effects in Metals and Alloys - This many-beam dynamical diffraction phenomenon, in which some Bragg resonances vanish at certain accelerating voltages, Vc, depends sensitively on the spacing of diffracting planes, Debye temperature θD and structure factors. Vc values can be measured to ± 0.5% in the HVEM ana used to obtain improved extinction distances and θD values appropriate to electron diffraction, as well as to probe local bonding effects and composition variations in alloys.

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Optical Properties of HVEM Accelerators

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100114529 ◽

1975 ◽

Vol 33 ◽

pp. 180-181

Author(s):

A. Strojnik ◽

J.W. Scholl ◽

V. Bevc

Keyword(s):

Optical Properties ◽

Electron Accelerator ◽

Systematic Investigation ◽

Electron Source ◽

High Brightness ◽

The Past ◽

Wide Range ◽

Optical Behavior

The electron accelerator, as inserted between the electron source (injector) and the imaging column of the HVEM, is usually a strong lens and should be optimized in order to ensure high brightness over a wide range of accelerating voltages and illuminating conditions. This is especially true in the case of the STEM where the brightness directly determines the highest resolution attainable. In the past, the optical behavior of accelerators was usually determined for a particular configuration. During the development of the accelerator for the Arizona 1 MEV STEM, systematic investigation was made of the major optical properties for a variety of electrode configurations, number of stages N, accelerating voltages, 1 and 10 MEV, and a range of injection voltages ϕ0 = 1, 3, 10, 30, 100, 300 kV).

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