Calibration of a piezoresistive stress sensor in [100] silicon test chips

Author(s):  
Z.W. Zhong ◽  
Xiaowu Zhang ◽  
B.H. Sim ◽  
E.H. Wong ◽  
P.S. Teo ◽  
...  
Keyword(s):  
2001 ◽  
Author(s):  
Venkataraman Chandrasekaran ◽  
Anthony Cain ◽  
Toshikazu Nishida ◽  
Louis Cattafesta ◽  
Mark Sheplak

Author(s):  
Brett Freidkes ◽  
David A. Mills ◽  
Casey Keane ◽  
Lawrence S. Ukeiley ◽  
Mark Sheplak

Author(s):  
Franco Stellari ◽  
Peilin Song

Abstract In this paper, the development of advanced emission data analysis methodologies for IC debugging and characterization is discussed. Techniques for automated layout to emission registration and data segmentations are proposed and demonstrated using both 22 nm and 14 nm SOI test chips. In particular, gate level registration accuracy is leveraged to compare the emission of different types of gates and quickly create variability maps automatically.


2021 ◽  
pp. 112891
Author(s):  
Congcong Hao ◽  
Wenjun Zhang ◽  
Bin Wu ◽  
Zhidong Zhang ◽  
Jian He ◽  
...  

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