A highly linear CMOS APS circuit for column-parallel readout with improved gain and process tolerance

2020 ◽  
Author(s):  
P. Anand ◽  
G. N. Arvind ◽  
B. Bhuvan
Keyword(s):  
Process Tolerance

Proximity correction for high CD accuracy and process tolerance

1995 ◽  
Vol 27 (1-4) ◽  
pp. 179-182 ◽  
Author(s):  
T. Waas ◽  
H. Eisenmann ◽  
O. Vo¨llinger ◽  
H. Hartmann
Keyword(s):  
Process Tolerance

scholarly journals Diffraction mechanism of five-port transmission gratings

2020 ◽  
Vol 50 (4) ◽  
Author(s):  
Chenhao Gao ◽  
Bo Wang ◽  
Kunhua Wen ◽  
Ziming Meng ◽  
Qu Wang ◽  
...  
Keyword(s):  
Beam Splitter ◽  
Diffraction Order ◽  
Normal Incidence ◽  
Propagation Mechanism ◽  
Beam Splitting ◽  
Transmission Grating ◽  
Process Tolerance ◽  
Wide Range ◽  
Rigorous Coupled Wave ◽  
Modal Method

This paper designs a five-port transmission grating under normal incidence. Rigorous coupled-wave approach is used to optimize the grating parameters. The energy of the grating is mainly dispersed to the 0th, ±1st and ±2nd orders. The efficiency of each diffraction order under both polarizations is close to 20%. The modal method is used to describe the propagation mechanism of the two polarized lights in the grating, and the diffraction behavior of the grating is analyzed. In addition, the grating has a wide range of incident characteristics and a large process tolerance. Therefore, this five-port beam splitter with a connecting layer will be a good polarization-independent beam splitting device.

scholarly journals Superior Textured Film and Process Tolerance Enabled by Intermediate‐State Engineering for High‐Efficiency Perovskite Solar Cells

2020 ◽  
Vol 7 (5) ◽  
pp. 1903009 ◽  
Author(s):  
Shubo Wang ◽  
Yiqi Chen ◽  
Ruiyi Li ◽  
Yibo Xu ◽  
Jiangshan Feng ◽  
...  
Keyword(s):  
Solar Cells ◽  
Intermediate State ◽  
High Efficiency ◽  
Perovskite Solar Cells ◽  
Process Tolerance

Implants of quail thymic epithelium generate permanent tolerance in embryonically constructed quail/chick chimeras

Development ◽  
1988 ◽  
Vol 104 (4) ◽  
pp. 619-630
Author(s):  
H. Ohki ◽  
C. Martin ◽  
M. Coltey ◽  
N.M. Le Douarin
Keyword(s):  
Branchial Arch ◽  
Histological Structure ◽  
Postnatal Life ◽  
Thymic Involution ◽  
Species Identity ◽  
Thymic Epithelium ◽  
Process Tolerance ◽  
Developmental Rates ◽  
Wing Bud

In situ implantation of a quail wing bud into a chick embryo at 4 days of incubation (E4) regularly results in the normal development of the implant followed by its acute rejection starting within two weeks post-hatching. If the epithelial thymic rudiments of the quail donor are implanted into the branchial arch area of the chick recipient after partial removal of its own thymic primordia, a chimeric thymus develops in the chick host and this induces tolerance to the quail wing by the chick recipient. The species identity of cells in chimeric thymuses was mapped using Feulgen-Rossenbeck' staining and immunolabelling with monoclonal antibodies directed against quail or chick B-L antigens. Certain lobes contained only chick cells both at the stromal and hemopoietic cell levels. Others had a quail epithelial stroma containing host hemopoietically derived cells. Only chimeras in which at least one third of the thymic lobes were chimeric showed permanent tolerance to the grafted wing. Since the two species exhibit distinct developmental rates, we decided to study the kinetics of thymic involution after birth. Although the changes in thymus weight and histological structure are fundamentally similar in quail and chick, those in the quail start about 7–8 weeks earlier. In the chimeric thymuses, the lobes whose epithelial cells were quail involuted at the rate of control quail showing no influence of the hemopoietic thymic compartment in this process. Tolerance induced by the thymic epithelium during embryogenesis and in early postnatal life was maintained after a profound involution of the quail thymic graft had occurred.

Three-Dimensional Tube Geometry Control for Rotary Draw Tube Bending, Part 2: Statistical Tube Tolerance Analysis and Adaptive Bend Correction

2000 ◽  
Vol 123 (2) ◽  
pp. 266-271 ◽  
Author(s):  
Huazhou Lou ◽  
Kim A. Stelson
Keyword(s):  
Three Dimensional ◽  
Tolerance Analysis ◽  
Bend Angle ◽  
Tube Bending ◽  
Process Error ◽  
Process Tolerance ◽  
Bending Process ◽  
Angle Bend ◽  
Geometry Error ◽  
Tube Geometry

The control of each individual bend and overall process is presented in Part 1 of the paper. In Part 2 of the paper, statistical methods are used to analyze and improve 3-D tube bending accuracy. The relationship between bending process error and tube geometry error is obtained with Monte Carlo simulation. For the same tube tolerance requirement, the required process tolerance varies in a large range based on tube geometry. Among the three bending errors: bend angle, bend plane and distance between bends, bend angle error has the largest influence on tube error. For a tube with multiple bends, the overall tube geometry error can be minimized by intentionally modifying the nominal values of the bends to be made based on the errors in the existing bends. The required modification of the bending commands is calculated with an adaptive bend correction algorithm.

Recording Performance & Process Tolerance Of Dual-stripe MR Heads

2005 ◽  
Author(s):  
Yimin Guo ◽  
Yimin Hsu ◽  
Kochan Ju
Keyword(s):  
Process Tolerance
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