Single Event Dielectric Rupture Phenomenon in Amorphous Silicon based MIM Structures

Author(s):  
Suzhen Wu ◽  
Haiming Xu ◽  
Ruocheng Zheng ◽  
Genshen Hong ◽  
Jianwei Wu ◽  
...  
2005 ◽  
Vol 862 ◽  
Author(s):  
Scott J. Jones ◽  
Joachim Doehler ◽  
Tongyu Liu ◽  
David Tsu ◽  
Jeff Steele ◽  
...  

AbstractNew types of transparent conductive oxides with low indices of refraction have been developed for use in optical stacks for the amorphous silicon (a-Si) solar cell and other thin film applications. The alloys are ZnO based with Si and MgF added to reduce the index of the materials through the creation of SiO2 or MgF2, with n=1.3-1.4, or the addition of voids in the materials. Alloys with 12-14% Si or Mg have indices of refraction at λ=800nm between 1.6 and 1.7. These materials are presently being used in optical stacks to enhance light scattering by Al/multi-layer/ZnO back reflectors in a-Si based solar cells to increase light absorption in the semiconductor layers and increase open circuit currents and boost device efficiencies. In contrast to Ag/ZnO back reflectors which have long term stability issues due to electromigration of Ag, these Al based back reflectors should be stable and usable in manufactured PV products. In this manuscript, structural properties for the materials will be reported as well as the performance of solar cell devices made using these new types of materials.


2009 ◽  
Vol E92-C (5) ◽  
pp. 708-712
Author(s):  
Dong-Heon HA ◽  
Chi Ho HWANG ◽  
Yong Soo LEE ◽  
Hee Chul LEE

2021 ◽  
Vol 118 (26) ◽  
pp. 263507
Author(s):  
Yanyun Ren ◽  
Xiaojing Fu ◽  
Zhi Yang ◽  
Ruoyao Sun ◽  
Ya Lin ◽  
...  

2002 ◽  
Vol 299-302 ◽  
pp. 1267-1271
Author(s):  
C.M Fortmann ◽  
A.H Mahan ◽  
N Hata

2008 ◽  
Author(s):  
T. Schimert ◽  
J. Brady ◽  
T. Fagan ◽  
M. Taylor ◽  
W. McCardel ◽  
...  

2001 ◽  
Vol 66 (1-4) ◽  
pp. 107-115 ◽  
Author(s):  
Yukimi Ichikawa ◽  
Takashi Yoshida ◽  
Toshio Hama ◽  
Hiroshi Sakai ◽  
Kouichi Harashima

2014 ◽  
Vol 55 ◽  
pp. 813-817 ◽  
Author(s):  
Erik S. Marstein ◽  
Ida M. Hasle ◽  
Atle J. Qviller ◽  
Halvard Haug

1998 ◽  
Vol 4 (6) ◽  
pp. 997-1002 ◽  
Author(s):  
G. Cocorullo ◽  
F.G. Della Corte ◽  
R. de Rosa ◽  
I. Rendina ◽  
A. Rubino ◽  
...  

2001 ◽  
Vol 685 ◽  
Author(s):  
M. Fernandes ◽  
Yu. Vygranenko ◽  
J. Martins ◽  
M. Vieira

AbstractWe suggest to enhance the performance of image acquisition systems based on large area amorphous silicon based sensors by optimizing the readout parameters such as the intensity and cross-section of scanner beam, acquisition time and bias conditions. The main output device characteristics as image responsivity, signal to noise ratio and spatial resolution were analyzed in open circuit, short circuit and photodiode modes. The result show that the highest signal to noise ratio and best dark to bright ratio can be achieved in short circuit mode.It was shown that the sensor resolution is related to the basic device parameters and, in practice, limited by the acquisition time and scanning beam properties. The scanning beam spot size limits the resolution due to the overlapping of dark and illuminated zones leading to a blurring effect on the final image and a consequent degradation in the resolution.


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