MOVPE III–V material growth on silicon substrates and its comparison to MBE for future high performance and low power logic applications

Author(s):  
N. Mukherjee ◽  
J. Boardman ◽  
B. Chu-Kung ◽  
G. Dewey ◽  
A. Eisenbach ◽  
...  
2015 ◽  
Vol 66 (4) ◽  
pp. 135-140 ◽  
Author(s):  
M. J. Rodwell ◽  
C.-Y. Huang ◽  
S. Lee ◽  
V. Chobpattana ◽  
B. Thibeault ◽  
...  

SPIN ◽  
2013 ◽  
Vol 03 (04) ◽  
pp. 1340014 ◽  
Author(s):  
TAKAHIRO HANYU

This paper presents an architecture-level approach, called nonvolatile logic-in-memory (NV-LIM) architecture, to solving performance-wall and power-wall problems in the present CMOS-only-based logic-LSI (Large-Scaled Integration) processors. The use of magnetic tunnel junction devices combined with a CMOS-gate style makes it possible to achieve a high-performance and ultra-low-power logic LSI. Some concrete examples using the proposed method allow you to achieve the desired performance improvement compared to a corresponding CMOS-only-based realization.


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