Electrically Detected Magnetic Resonance Study of High-Field Stress Induced Si/SiO2 Interface Defects
2014 ◽
Vol 778-780
◽
pp. 414-417
◽
2019 ◽
Vol 66
(1)
◽
pp. 405-412
◽
2009 ◽
Vol 4
(3)
◽
pp. 159-168
◽