Combination of electron beam recorders and imprint lithography for realisation of patterned media and next generation optical media

2005 ◽  
Author(s):  
B. Heidari ◽  
T. Moller ◽  
R. Palm ◽  
E. Bolmsjo ◽  
M. Beck
Keyword(s):  
Electron Beam ◽  
Next Generation ◽  
Imprint Lithography ◽  
Patterned Media ◽  
Optical Media

Fabrication of fine pitch gratings by holography, electron beam lithography and nano-imprint lithography

2007 ◽  
Author(s):  
Darren Goodchild ◽  
Alexei Bogdanov ◽  
Simon Wingar ◽  
Bill Benyon ◽  
Nak Kim ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Imprint Lithography ◽  
Fine Pitch ◽  
Nano Imprint

Particle Contamination Control Technology in Electron Beam Mask Writing System for Next-Generation Mask Fabrication

2002 ◽  
Vol 41 (Part 1, No. 9) ◽  
pp. 5835-5840
Author(s):  
Kiminobu Akeno ◽  
Munehiro Ogasawara ◽  
Kenji Ooki ◽  
Toru Tojo ◽  
Ryoichi Hirano ◽  
...  
Keyword(s):  
Electron Beam ◽  
Control Technology ◽  
Writing System ◽  
Next Generation ◽  
Contamination Control ◽  
Particle Contamination ◽  
Mask Fabrication

Fabrication of bio-inspired 3D nanoimprint mold using acceleration-voltage-modulation electron-beam lithography

2019 ◽  
Vol 8 (3-4) ◽  
pp. 289-297 ◽  
Author(s):  
Kohei Goto ◽  
Jun Taniguchi
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Three Dimensional ◽  
Modulation Method ◽  
Imprint Lithography ◽  
3D Structures ◽  
Rose Petal ◽  
Rose Petals ◽  
Acceleration Voltage ◽  
Nano Imprint

Abstract Methods for fabricating micro- and nanoscale three-dimensional (3D) structures such as electron-beam lithography (EBL) attracted attention in various fields. In EBL, an acceleration-voltage modulation method can be used to control the developing depth of the structure. In this study, we fabricated a rose petal structure using acceleration-voltage modulation. Using a rose petal mold, plastic- and silver-duplicated rose petals were prepared using nano-imprint lithography (NIL). We demonstrated that various complex 3D structures and materials can be duplicated using NIL by applying an acceleration-voltage modulation method.

Template Fabrication Challenges for Patterned Media

2006 ◽  
Vol 961 ◽  
Author(s):  
Douglas Resnick ◽  
Gerard Schmid ◽  
Mike Miller ◽  
Gary Doyle ◽  
Chris Jones ◽  
...  
Keyword(s):  
Photonic Crystal ◽  
High Resolution ◽  
Photonic Crystals ◽  
Imprint Lithography ◽  
Large Area ◽  
Uv Curable ◽  
Wire Grid ◽  
Patterned Media ◽  
Pattern Density ◽  
Mix And Match

ABSTRACTThe Step and Flash Imprint Lithography (S-FILTM) process uses field-to-field drop dispensing of UV curable liquids for step and repeat patterning for applications where high-resolution mix-and-match overlay is desired. Several applications, including patterned media, photonic crystals and wire grid polarizers, are better served by a patterning process that prints the full wafer since alignment requirements are not so stringent. In this paper, a methodology for creating high resolution thin templates for full wafer (or disk) imprinting is described. The methods have been applied toward the imprinting of both patterned media and photonic crystal devices using a large area printing tool developed around the S-FIL process. Techniques for further enhancing the pattern density as well as a method for addressing feature image placement are described. Finally, a process for replicating a Master Template is discussed in detail.

Defect inspection for imprint lithography using a die-to-database electron beam verification system

2006 ◽  
Author(s):  
L. Jeff Myron ◽  
Ecron Thompson ◽  
Ian McMackin ◽  
Douglas J. Resnick ◽  
Tadashi Kitamura ◽  
...  
Keyword(s):  
Electron Beam ◽  
Imprint Lithography ◽  
Defect Inspection ◽  
Verification System
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