Field emission from bias grown diamond thin films in a CH/sub 4//N/sub 2//H/sub 2/ plasma

Author(s):  
M.O. Ding ◽  
D.M. Gruen ◽  
A.R. Krauss ◽  
O. Auciello ◽  
T.D. Corrigan ◽  
...  
Author(s):  
M. Q. Ding ◽  
D. M. Gruen ◽  
A. R. Krauss ◽  
O. Auciello ◽  
T. D. Corrigan ◽  
...  

1997 ◽  
Vol 82 (9) ◽  
pp. 4546-4550 ◽  
Author(s):  
D. Zhou ◽  
A. R. Krauss ◽  
L. C. Qin ◽  
T. G. McCauley ◽  
D. M. Gruen ◽  
...  

2003 ◽  
Vol 95 ◽  
pp. 75-80 ◽  
Author(s):  
Z.B. Li ◽  
X.W. Liu ◽  
N.S. Xu ◽  
S.Z. Deng ◽  
Jun Chen ◽  
...  

Vacuum ◽  
2003 ◽  
Vol 72 (3) ◽  
pp. 321-326 ◽  
Author(s):  
P.M. Koinkar ◽  
P.P. Patil ◽  
M.A. More ◽  
V.N. Tondare ◽  
D.S. Joag

1997 ◽  
Vol 36 (Part 2, No. 9A/B) ◽  
pp. L1250-L1253 ◽  
Author(s):  
Masayoshi Nagao ◽  
Toshiyuki Kondo ◽  
Yasuhito Gotoh ◽  
Hiroshi Tsuji ◽  
Junzo Ishikawa ◽  
...  

2003 ◽  
Vol 18 (11) ◽  
pp. 2708-2716 ◽  
Author(s):  
S. Gupta ◽  
B.R. Weiner ◽  
G. Morell

Results are reported on the electron field emission properties of microcrystalline diamond thin films grown on molybdenum substrates by the sulfur (S)-assisted hot-filament chemical vapor deposition technique using methane (CH4), hydrogen sulfide (H2S), and hydrogen (H2) gas mixtures. Electron field-emission measurements revealed that the S-incorporated microcrystalline diamond thin films have substantially lower turn-on fields and steep rising currents as compared to those grown without sulfur. The field-emission properties for the S-incorporated films were also investigated systematically as a function of substrate temperature (TS). Lowest turn-on field achieved was observed at around 12.5 V/μm for the samples grown at TS of 700°C with 500 ppm H2S. To establish the property-structure correlation, we analyzed the films with multiple characterizations include scanning electron microscopy (SEM), atomic force microscopy (AFM), Raman spectroscopy (RS), and x-ray photoelectron spectroscopy (XPS) techniques. It was found that sulfur addition causes significant microstructural changes in microcrystalline diamond thin films. S-assisted films show smoother, coarse-grained surfaces (non-faceted) than those grown without it (well-faceted) and a relatively higher content of non-diamond carbon (primarily sp2-bonded C). RS and investigations on the morphology by SEM and AFM indicated the increase of sp2 C content with increasing TS followed by a morphological transition at 700°C in the films. XPS investigations also showed the incorporation of S in the films up to a few atomic layers. It is believed that the electron-emission properties are governed by the sulfur incorporation during the chemical vapor deposition process. Although most of the S is expected to be electrically inactive, under the high doping conditions hereby used, it is shown rather indirectly through multiple characterizations that there may be some amount of S in donor states. Therefore the results are discussed in terms of the dual role of S whereby it induces the structural defects in the form of enhanced sp2 C content at the expense of diamond quality and a possibility of availability of conduction electrons. In fact the latter finding is supported through room temperature electrical conductivity measurements.


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