Effect of silicon substrate hydrogenation treatment on nickel silicide formation

2004 ◽  
Author(s):  
A. Vengurlekar ◽  
S. Balasubramanian ◽  
S. Ashok ◽  
D. Theodore ◽  
D.Z. Chi
Keyword(s):  
Silicon Substrate ◽  
Nickel Silicide ◽  
Silicide Formation ◽  
Hydrogenation Treatment

In situ study of the growth kinetics and interfacial roughness during the first stages of nickel–silicide formation

2006 ◽  
Vol 83 (11-12) ◽  
pp. 2253-2257 ◽  
Author(s):  
L. Ehouarne ◽  
M. Putero ◽  
D. Mangelinck ◽  
F. Nemouchi ◽  
T. Bigault ◽  
...  
Keyword(s):  
Growth Kinetics ◽  
Nickel Silicide ◽  
Silicide Formation ◽  
Interfacial Roughness ◽  
In Situ Study

Nitrogen impurity effects on nickel silicide formation at low temperatures – New “nitrogen co-plasma” approach

2008 ◽  
Vol 85 (10) ◽  
pp. 2005-2008 ◽  
Author(s):  
B. Imbert ◽  
M. Gregoire ◽  
S. Zoll ◽  
R. Beneyton ◽  
S. Del-Medico ◽  
...  
Keyword(s):  
Low Temperatures ◽  
Nickel Silicide ◽  
Silicide Formation ◽  
Impurity Effects ◽  
Nitrogen Impurity

The effect of pulsed laser annealing on the nickel silicide formation

2010 ◽  
Vol 87 (12) ◽  
pp. 2540-2543 ◽  
Author(s):  
Hou-Yu Chen ◽  
Chia-Yi Lin ◽  
Chien-Chao Huang ◽  
Chao-Hsin Chien
Keyword(s):  
Laser Annealing ◽  
Pulsed Laser ◽  
Nickel Silicide ◽  
Silicide Formation ◽  
Pulsed Laser Annealing

Novel Nickel Silicide Formation Technique for Sub-50nm MOS Device Application

2002 ◽  
Author(s):  
JeoungChill Shim ◽  
Chang-woo Lee ◽  
Takeshi Sakaguchi ◽  
Hyuckjae Oh ◽  
Hoon Choi ◽  
...  
Keyword(s):  
Nickel Silicide ◽  
Silicide Formation ◽  
Device Application ◽  
Formation Technique ◽  
Mos Device

Carbon Outdiffusion from Ni(C)/Pt/Si Structures During Nickel Silicide Formation by Rapid Thermal Annealing

2019 ◽  
Vol 4 (1) ◽  
pp. 503-511
Author(s):  
Ronaldo W. Reise ◽  
S. G. dos Santos Filho ◽  
I. Doi ◽  
Rogério Furlan ◽  
Richard Landers
Keyword(s):  
Thermal Annealing ◽  
Rapid Thermal Annealing ◽  
Nickel Silicide ◽  
Silicide Formation

Orientation dependence of nickel silicide formation in contacts to silicon nanowires

2009 ◽  
Vol 105 (9) ◽  
pp. 094309 ◽  
Author(s):  
N. S. Dellas ◽  
B. Z. Liu ◽  
S. M. Eichfeld ◽  
C. M. Eichfeld ◽  
T. S. Mayer ◽  
...  
Keyword(s):  
Silicon Nanowires ◽  
Orientation Dependence ◽  
Nickel Silicide ◽  
Silicide Formation
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