plasma surface treatment
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Materials ◽  
2022 ◽  
Vol 15 (2) ◽  
pp. 496
Author(s):  
Lisa Krautwald ◽  
Ralf Smeets ◽  
Carolin Stolzer ◽  
Rico Rutkowski ◽  
Linna Guo ◽  
...  

The influence of UV light and non-thermal plasma on the osseointegration of yttria-stabilized zirconia implants (Y-TZP) comparing the two methods is unclear. The aim of this study was to show the influence of these methods on the osseointegration of dental zirconia implants in an animal model. A total of 54 implants were either untreated, treated with UV light (UV), or non-thermal oxygen plasma for 12 min and inserted into the parietal bones of six domestic pigs. The animals were sacrificed after a healing interval of two, four, and nine weeks. The degree of osseointegration was determined using histomorphometric determination of bone-to-implant contact values (BIC) and the bone-to-implant contact values within the retentive parts of the implants (BAFO). BIC values decreased in all groups after four weeks of healing and re-increased after nine weeks in all groups. BAFO increased significantly over time in all groups. However, there were no statistically significant differences in BIC and BAFO values between the control group and the test groups and over time. Clinical studies may follow to confirm the influence of cold plasma and UV light on the healing and survival of zirconia implants.


2021 ◽  
Vol 2086 (1) ◽  
pp. 012033
Author(s):  
A A Rezvan ◽  
J V Morozova ◽  
V S Klimin

Abstract This paper presents a study of the use of silicon Si for element base manufacture of micro- and nanoelectronics by using combined methods of focused ion beams and atomic layer plasma chemical etching. This technology makes it possible to modify surface of Si substrates in the required topology and geometry, followed by removal of atoms to obtain nanoscale elements. The influence of parameters of method of focused ion beams and plasma chemical etching on parameters of the formed structures is analyzed. So, for example, for formation of structures with maximum roughness, it is necessary to increase values of parameters responsible for reactive ion etching, these are such parameters as: the power of capacitive plasma source, the mixing voltage, and the flow rate of an inert gas (argon).


2021 ◽  
Vol 18 (120) ◽  
pp. 241-252
Author(s):  
Seyedeh Leila Nasiri ◽  
Mohammad Hossein Azizi ◽  
Farnaz Movahedi ◽  
Nahid Rahimifard ◽  
Hamid Tavakolipour ◽  
...  

2021 ◽  
pp. 2103952
Author(s):  
Hao Jia ◽  
Minghui Qiu ◽  
Chuntao Lan ◽  
Hongqi Liu ◽  
Mahmut Dirican ◽  
...  

2021 ◽  
pp. 151963
Author(s):  
Yen Theng Lau ◽  
Oi Hoong Chin ◽  
Hong Chun Lee ◽  
Wee Siong Chiu ◽  
Haw Jiunn Woo

Coatings ◽  
2021 ◽  
Vol 11 (11) ◽  
pp. 1291
Author(s):  
Youbean Kim

Research trends and emerging technologies were explored through the Web of Science (WoS) literature of the last decade in relation to plasma technology, especially plasma surface treatment, widely used in all industries. For this, a network analysis using country and author keywords and emerging technology search algorithms, with regard to novelty, fast growth and impact, were used. As a result, we derived 40 keywords in terms of novelty and fast growth. Additionally, with these keywords, we traced the impact based on the citation relationships. Finally, nine keywords which were analyzed to contain many new technological issues were identified by deriving the author keywords included in the relevant documents. It is expected that the new technology fields derived from this paper can contribute to establishing a preemptive R&D strategy.


Author(s):  
Williams Marcel Caceres-Ferreira ◽  
Graciela Morales ◽  
Gustavo Soria-Arguello ◽  
María del Carmen Aguilar-Castro ◽  
Ana Cristina Amparán-Estrada ◽  
...  

Polymers ◽  
2021 ◽  
Vol 13 (6) ◽  
pp. 901
Author(s):  
Miklós Berczeli ◽  
Zoltán Weltsch

The development of bonding technology and coating technologies require the use of modern materials and topologies for the demanding effect and modification of their wetting properties. For the industry, a process modification process that can be integrated into a process is the atmospheric pressure of air operation plasma surface treatment. This can be classified and evaluated based on the wettability, which has a significant impact on the adhesive force. The aim is to improve the wetting properties and to find the relationship between plasma treatment parameters, wetting, and adhesion. High Impact PolyStyrene (HIPS) was used as an experimental material, and then the plasma treatment can be treated with various adjustable parameters. The effect of plasma parameters on surface roughness, wetting contact angle, and using Fowkes theory of the surface energy have been investigated. Seven different plasma jet treatment distances were tested, combined with 5 scan speeds. Samples with the best plasma parameters were prepared from 25 mm × 25 mm overlapping adhesive joints using acrylic/cyanoacrylate. The possibility of creating a completely hydrophilic surface was achieved, where the untreated wetting edge angle decreased from 88.2° to 0° for distilled water and from 62.7° to 0° in the case of ethylene glycol. The bonding strength of High Impact PolyStyrene was increased by plasma treatment by 297%.


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