Surface treatment effect on the poly-Si TFTs fabricated by electric field enhanced crystallization of Ni/a-Si:H films

2003 ◽  
Vol 24 (12) ◽  
pp. 733-735 ◽  
Author(s):  
Binn Kim ◽  
Hae-Yeol Kim ◽  
Hyun-Sik Seo ◽  
Sung Ki Kim ◽  
Chang-Dong Kim
Keyword(s):  
Electric Field ◽  
Surface Treatment ◽  
Treatment Effect

Surface Treatment Effect on Fatigue Characteristics of Molybdenum

Fatigue '96 ◽  
1996 ◽  
pp. 1427-1432
Author(s):  
A.G. Kolmakov ◽  
I.J. Bunin ◽  
G.V. Vstovsky
Keyword(s):  
Surface Treatment ◽  
Treatment Effect ◽  
Fatigue Characteristics

The effect of mixed electric field on characteristic of Ar–N2 plasma jets for TiN surface treatment

2020 ◽  
Vol 53 (12) ◽  
pp. 125201
Author(s):  
P Seyfi ◽  
A Khademi ◽  
S Ghasemi ◽  
A Farhadizadeh ◽  
H Ghomi
Keyword(s):  
Electric Field ◽  
Surface Treatment ◽  
Plasma Jets ◽  
N2 Plasma

Investigation of surface treatment effect of catalyst on the lifetime for Cat-CVD method

2008 ◽  
Vol 354 (19-25) ◽  
pp. 2117-2120 ◽  
Author(s):  
Kazuhiro Honda ◽  
Keisuke Ohdaira ◽  
Hideki Matsumura
Keyword(s):  
Surface Treatment ◽  
Treatment Effect ◽  
Cvd Method

Plasma surface treatment effect of TiO2 thin film

Vacuum ◽  
2004 ◽  
Vol 74 (3-4) ◽  
pp. 643-646 ◽  
Author(s):  
Yoshiaki Chiba ◽  
Kunihiro Kashiwagi ◽  
Hideki Kokai
Keyword(s):  
Thin Film ◽  
Surface Treatment ◽  
Treatment Effect ◽  
Tio2 Thin Film ◽  
Plasma Surface ◽  
Plasma Surface Treatment

Surface treatment effect in thermoplastic rubber and natural leather for the footwear industry

2015 ◽  
Vol 46 (6) ◽  
pp. 632-643
Author(s):  
R. M. M. Paiva ◽  
E. A. S. Marques ◽  
L. F. M. da Silva ◽  
C. A. C. António
Keyword(s):  
Surface Treatment ◽  
Treatment Effect ◽  
Footwear Industry ◽  
Thermoplastic Rubber

Effects of CF4 Surface Etching on 4H-SiC MOS Capacitors

2018 ◽  
Vol 924 ◽  
pp. 465-468
Author(s):  
Kiichi Kobayakawa ◽  
Kosuke Muraoka ◽  
Hiroshi Sezaki ◽  
Seiji Ishikawa ◽  
Tomonori Maeda ◽  
...  
Keyword(s):  
Electric Field ◽  
Surface Treatment ◽  
Dry Etching ◽  
Etching Process ◽  
Mos Capacitors ◽  
Mos Capacitor ◽  
Breakdown Electric Field ◽  
Surface Etching

Effects of CF4etching on 4H-SiC MOS capacitor were investigated. Fluorine atoms were introduced to surface of 4H-SiC using CF4dry etching process as a surface treatment, and 4H-SiC MOS capacitors with dry-oxide were fabricated with this treatment. As the results, breakdown electric field of the MOS capacitors was increased and variation of the characteristics became lower than that of MOS capacitor without this treatment.

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