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Low-Frequency Noise Assessment of the Oxide Quality of Gate-Last High- $k$ pMOSFETs
IEEE Electron Device Letters
◽
10.1109/led.2012.2210993
◽
2012
◽
Vol 33
(10)
◽
pp. 1366-1368
◽
Cited By ~ 8
Author(s):
E. Simoen
◽
A. Veloso
◽
N. Horiguchi
◽
C. Claeys
Keyword(s):
Low Frequency
◽
Frequency Noise
◽
Low Frequency Noise
◽
High K
◽
Noise Assessment
Download Full-text
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Low-Frequency Noise Assessment of Work Function Engineering Cap Layers in High-k Gate Stacks
ECS Journal of Solid State Science and Technology
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10.1149/2.0221902jss
◽
2019
◽
Vol 8
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◽
pp. N25-N31
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Cited By ~ 5
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C. Claeys
◽
R. Ritzenthaler
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...
Keyword(s):
Work Function
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Low Frequency
◽
Frequency Noise
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Low Frequency Noise
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Gate Stacks
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High K
◽
Noise Assessment
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Estimating the Quality of Thermionic Cathodes for Microwave Vacuum Tubes Using the Low-Frequency Noise Parameters
Vestnik MEI
◽
10.24160/1993-6982-2018-5-120-127
◽
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◽
Vol 5
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◽
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Author(s):
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◽
◽
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◽
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Keyword(s):
Low Frequency
◽
Frequency Noise
◽
Low Frequency Noise
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Noise Parameters
◽
Thermionic Cathodes
◽
Vacuum Tubes
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Investigation of low-frequency noise of 28-nm technology process of high-k/metal gate p-MOSFETs with fluorine incorporation
Solid-State Electronics
◽
10.1016/j.sse.2015.09.013
◽
2016
◽
Vol 115
◽
pp. 7-11
Author(s):
Tsung-Hsien Kao
◽
Shoou-Jinn Chang
◽
Yean-Kuen Fang
◽
Po-Chin Huang
◽
Bo-Chin Wang
◽
...
Keyword(s):
Low Frequency
◽
Frequency Noise
◽
Low Frequency Noise
◽
Metal Gate
◽
High K
◽
Technology Process
◽
28 Nm
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Improving Low-Frequency Noise in 14-nm FinFET by Optimized High-k/Metal Gate Thermal Processing
IEEE Electron Device Letters
◽
10.1109/led.2021.3091488
◽
2021
◽
pp. 1-1
Author(s):
Hao Zhu
◽
Bin Ye
◽
Chengkang Tang
◽
Xianghui Li
◽
Qingqing Sun
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Keyword(s):
Thermal Processing
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Low Frequency
◽
Frequency Noise
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Low Frequency Noise
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Metal Gate
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High-k Gate Stack Engineering and Low Frequency Noise Performance
ECS Meeting Abstracts
◽
10.1149/ma2006-01/9/405
◽
2006
◽
Keyword(s):
Low Frequency
◽
Frequency Noise
◽
Noise Performance
◽
Low Frequency Noise
◽
Gate Stack
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Low-Frequency Noise Investigation and Noise Variability Analysis in High- $k$/Metal Gate 32-nm CMOS Transistors
IEEE Transactions on Electron Devices
◽
10.1109/ted.2011.2141139
◽
2011
◽
Vol 58
(8)
◽
pp. 2310-2316
◽
Cited By ~ 32
Author(s):
Diana Lopez
◽
S. Haendler
◽
C. Leyris
◽
Gregory Bidal
◽
Gérard Ghibaudo
Keyword(s):
Low Frequency
◽
Frequency Noise
◽
Low Frequency Noise
◽
Metal Gate
◽
Variability Analysis
◽
Cmos Transistors
◽
High K
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Impact of Trap Behavior in High-k/Metal Gate p-MOSFET with Incorporated Fluorine on Low-Frequency Noise Characteristics
10.7567/ssdm.2014.ps-3-4
◽
2014
◽
Author(s):
T.–H. Kao
◽
S.–L. Wu
◽
C.–Y. Wu
◽
Y.–K. Fang
◽
P.–C. Huang
◽
...
Keyword(s):
Low Frequency
◽
Frequency Noise
◽
Low Frequency Noise
◽
Metal Gate
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Low-frequency noise in high-k LaLuO3/TiN MOSFETs
Solid-State Electronics
◽
10.1016/j.sse.2012.05.070
◽
2012
◽
Vol 78
◽
pp. 51-55
◽
Cited By ~ 10
Author(s):
Maryam Olyaei
◽
B. Gunnar Malm
◽
Per-Erik Hellström
◽
Mikael Östling
Keyword(s):
Low Frequency
◽
Frequency Noise
◽
Low Frequency Noise
◽
High K
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Low-Frequency Noise Assessment of the Oxide Trap Density in Thick-Oxide Input-Output Transistors for DRAM Applications
ECS Journal of Solid State Science and Technology
◽
10.1149/2.0051606jss
◽
2016
◽
Vol 5
(6)
◽
pp. N27-N31
◽
Cited By ~ 8
Author(s):
E. Simoen
◽
R. Ritzenthaler
◽
M.-J. Cho
◽
T. Schram
◽
N. Horiguchi
◽
...
Keyword(s):
Low Frequency
◽
Trap Density
◽
Frequency Noise
◽
Low Frequency Noise
◽
Input Output
◽
Noise Assessment
◽
Oxide Trap
Download Full-text
Impact of Aluminum Ion Implantation on the Low Frequency Noise Characteristics of Hf-Based High-\(k\) /Metal Gate pMOSFETs
IEEE Electron Device Letters
◽
10.1109/led.2014.2336866
◽
2014
◽
Vol 35
(9)
◽
pp. 954-956
◽
Cited By ~ 1
Author(s):
Tsung-Hsien Kao
◽
Osbert Cheng
◽
Shoou-Jinn Chang
◽
San-Lein Wu
◽
Chung-Yi Wu
◽
...
Keyword(s):
Ion Implantation
◽
Low Frequency
◽
Frequency Noise
◽
Low Frequency Noise
◽
Metal Gate
◽
Aluminum Ion
◽
Noise Characteristics
◽
High K
Download Full-text
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