scholarly journals Efficient silicon-on-insulator fiber coupler fabricated using 248-nm-deep UV lithography

2005 ◽  
Vol 17 (12) ◽  
pp. 2613-2615 ◽  
Author(s):  
G. Roelkens ◽  
P. Dumon ◽  
W. Bogaerts ◽  
D. Van Thourhout ◽  
R. Baets
Keyword(s):  
Silicon On Insulator ◽  
Fiber Coupler ◽  
Uv Lithography ◽  
Deep Uv

scholarly journals Dual-band fiber-chip grating coupler in a 300 mm silicon-on-insulator platform and 193-nm deep-UV lithography

2020 ◽  
Author(s):  
David Gonzalez-Andrade ◽  
Diego Pérez Galacho ◽  
Miguel Montesinos Ballester ◽  
Xavier LE ROUX ◽  
Eric Cassan ◽  
...  
Keyword(s):  
Silicon On Insulator ◽  
Dual Band ◽  
Grating Coupler ◽  
Uv Lithography ◽  
Deep Uv ◽  
193 Nm

Fabrication of photonic crystals in silicon-on-insulator using 248-nm deep UV lithography

2002 ◽  
Vol 8 (4) ◽  
pp. 928-934 ◽  
Author(s):  
W. Bogaerts ◽  
V. Wiaux ◽  
D. Taillaert ◽  
S. Beckx ◽  
B. Luyssaert ◽  
...  
Keyword(s):  
Photonic Crystals ◽  
Silicon On Insulator ◽  
Uv Lithography ◽  
Deep Uv

scholarly journals Large plasmonic color metasurfaces fabricated by super resolution deep UV lithography

2021 ◽  
Vol 3 (8) ◽  
pp. 2236-2244
Author(s):  
Matthias Keil ◽  
Alexandre Emmanuel Wetzel ◽  
Kaiyu Wu ◽  
Elena Khomtchenko ◽  
Jitka Urbankova ◽  
...  
Keyword(s):  
Super Resolution ◽  
Large Area ◽  
Uv Lithography ◽  
Deep Uv

A novel super resolution deep UV lithography method is employed to fabricate large area plasmonic metasurfaces.

scholarly journals 193-nm deep-UV lithography system using a line-narrowed ArF excimer laser

1993 ◽  
Author(s):  
Bruce W. Smith ◽  
Malcolm C. Gower ◽  
Mark Westcott ◽  
Lynn F. Fuller
Keyword(s):  
Excimer Laser ◽  
Uv Lithography ◽  
Arf Excimer Laser ◽  
Deep Uv ◽  
193 Nm ◽  
Lithography System

Fabrication of AlGaN/GaN HEMTs with slant field plates by using deep-UV lithography

2012 ◽  
Author(s):  
Ting-En Hsieh ◽  
Lu-Che Huang ◽  
Yueh-Chin Lin ◽  
Chia-Hua Chang ◽  
Huan-Chung Wang ◽  
...  
Keyword(s):  
Uv Lithography ◽  
Gan Hemts ◽  
Deep Uv

Evaluation of aliphatic 2-diazoketones as photoactive compounds for deep-UV lithography

1990 ◽  
Author(s):  
George Schwartzkopf ◽  
Kathleen B. Gabriel ◽  
John B. Covington
Keyword(s):  
Uv Lithography ◽  
Deep Uv
Sign in / Sign up

Export Citation Format

Share Document