Surface preparation of metal films by gas cluster ion beams using organic acid vapor for wafer bonding

Mapping Intimacies ◽

10.1109/ltb-3d53950.2021.9598403 ◽

2021 ◽

Author(s):

S. Hanahara ◽

N. Toyoda

Keyword(s):

Organic Acid ◽

Wafer Bonding ◽

Surface Preparation ◽

Metal Films ◽

Ion Beams ◽

Cluster Ion Beams ◽

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Low temperature wafer bonding with gas cluster ion beams

2019 6th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D) ◽

10.23919/ltb-3d.2019.8735342 ◽

2019 ◽

Author(s):

Noriaki Toyoda ◽

Shota Ikeda

Keyword(s):

Low Temperature ◽

Wafer Bonding ◽

Ion Beams ◽

Cluster Ion Beams ◽

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Cu pattern etching by oxygen gas cluster ion beams with acetic acid vapor

IEEE International Interconnect Technology Conference ◽

10.1109/iitc.2014.6831879 ◽

2014 ◽

Author(s):

N. Toyoda ◽

M. Kojima ◽

R. Hinoura ◽

A. Yamaguchi ◽

K. Hara ◽

...

Keyword(s):

Acetic Acid ◽

Ion Beams ◽

Cluster Ion Beams ◽

Cluster Ion ◽

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Ultra-Smooth Surface Preparation Using Gas Cluster Ion Beams

Japanese Journal of Applied Physics ◽

10.1143/jjap.41.4287 ◽

2002 ◽

Vol 41 (Part 1, No. 6B) ◽

pp. 4287-4290 ◽

Author(s):

Noriaki Toyoda ◽

Shinji Matsui ◽

Isao Yamada

Keyword(s):

Smooth Surface ◽

Surface Preparation ◽

Ion Beams ◽

Cluster Ion Beams ◽

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Ultra-smooth surface preparation with gas cluster ion beams

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468) ◽

10.1109/imnc.2001.984054 ◽

2002 ◽

Author(s):

N. Toyoda ◽

S. Matsui ◽

I. Yamada

Keyword(s):

Smooth Surface ◽

Surface Preparation ◽

Ion Beams ◽

Cluster Ion Beams ◽

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Secondary ion emission from insulin film bombarded with methane and noble gas cluster ion beams

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ◽

10.1016/j.nimb.2013.05.064 ◽

2013 ◽

Vol 315 ◽

pp. 300-303 ◽

Author(s):

Kousuke Moritani ◽

Masanori Kanai ◽

Kosuke Goto ◽

Issei Ihara ◽

Norio Inui ◽

...

Keyword(s):

Noble Gas ◽

Ion Beams ◽

Secondary Ion Emission ◽

Cluster Ion Beams ◽

Cluster Ion ◽

Ion Emission ◽

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Molecular depth profiling and imaging using cluster ion beams with femtosecond laser postionization

Applied Surface Science ◽

10.1016/j.apsusc.2008.05.123 ◽

2008 ◽

Vol 255 (4) ◽

pp. 831-833 ◽

Author(s):

D. Willingham ◽

A. Kucher ◽

N. Winograd

Keyword(s):

Femtosecond Laser ◽

Depth Profiling ◽

Ion Beams ◽

Molecular Depth Profiling ◽

Cluster Ion Beams ◽

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Study on the coloration response of a radiochromic film to MeV cluster ion beams

Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment ◽

10.1016/j.nima.2017.07.054 ◽

2017 ◽

Vol 872 ◽

pp. 126-130 ◽

Author(s):

Yosuke Yuri ◽

Kazumasa Narumi ◽

Atsuya Chiba ◽

Yoshimi Hirano ◽

Yuichi Saitoh

Keyword(s):

Ion Beams ◽

Radiochromic Film ◽

Cluster Ion Beams ◽

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Morphology dependence of surface smoothing of Ar gas cluster ion beams

Novel Materials Processing by Advanced Electromagnetic Energy Sources ◽

10.1016/b978-008044504-5/50049-0 ◽

2005 ◽

pp. 241-244

Author(s):

S. Houzumi ◽

T. Mashita ◽

N. Toyoda ◽

K. Mochiji ◽

T. Mitamura ◽

...

Keyword(s):

Ion Beams ◽

Surface Smoothing ◽

Cluster Ion Beams ◽

Cluster Ion ◽

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Characteristics and peculiarities of surface processing by gas cluster ion beams

Ion Beam Processing of Materials and Deposition Processes of Protective Coatings ◽

10.1016/b978-0-444-82410-3.50054-0 ◽

1996 ◽

pp. 242-247

Author(s):

Isao Yamada

Keyword(s):

Ion Beams ◽

Surface Processing ◽

Cluster Ion Beams ◽

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Surface modifications by gas cluster ion beams

Ion Beam Modification of Materials ◽

10.1016/b978-0-444-82334-2.50035-6 ◽

1996 ◽

pp. 165-169

Author(s):

I. Yamada ◽

J. Matsuo ◽

Z. Insepov ◽

M. Akizuki

Keyword(s):

Surface Modifications ◽

Ion Beams ◽

Cluster Ion Beams ◽

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