Combining high-resolution X-ray reciprocal space mapping and dark-field electron holography for strain analysis in 20 nm pMOS structures
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X Ray
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2017 ◽
Vol 23
(S1)
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pp. 1490-1491
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2015 ◽
Vol 71
(a1)
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pp. s400-s400
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1995 ◽
Vol 6
(5)
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pp. 292-297
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2019 ◽
Vol 64
(4)
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pp. 545-552
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1996 ◽
Vol 89
(2)
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pp. 115-127
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1995 ◽
Vol 10
(12)
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pp. 1621-1628
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