Tribological properties of polycrystalline diamond films prepared by hot-filament chemical vapor deposition methods

2016 ◽  
Author(s):  
Hiroshi Nagasaka ◽  
Keita Ito ◽  
Jo Mori ◽  
Tetsuhide Shimizu ◽  
Shinya Sasaki
Keyword(s):  
Chemical Vapor Deposition ◽  
Tribological Properties ◽  
Vapor Deposition ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
Hot Filament

Examination of the material properties and performance of thin-diamond film cutting tool inserts produced by arc-jet and hot filament chemical vapor deposition

1996 ◽  
Vol 11 (7) ◽  
pp. 1765-1775 ◽  
Author(s):  
James M. Olson ◽  
Michael J. Dawes
Keyword(s):  
Wear Resistance ◽  
Chemical Vapor Deposition ◽  
Diamond Film ◽  
Vapor Deposition ◽  
Cutting Tool ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
And Performance ◽  
Hot Filament

Thin diamond film coated WC-Co cutting tool inserts were produced using arc-jet and hot-filament chemical vapor deposition. The diamond films were characterized using SEM, XRD, and Raman spectroscopy to examine crystal structure, fracture mode, thickness, crystalline orientation, diamond quality, and residual stress. The performance of the tools was evaluated by comparing the wear resistance of the materials to brazed polycrystalline diamond-tipped cutting tool inserts (PCD) while machining A390 aluminum (18% silicon). Results from the experiments carried out in this study suggest that the wear resistance of the thin diamond films is primarily related to the grain boundary strength, crystal orientation, and the density of microdefects in the diamond film.

Characterization of undoped and boron-doped polycrystalline diamond films synthesized by hot-filament chemical vapor deposition using methanol

1994 ◽  
Vol 3 (4-6) ◽  
pp. 618-622 ◽  
Author(s):  
Takashi Sugino ◽  
Kiyoshi Karasutani ◽  
Fumihiro Mano ◽  
Hiroya Kataoka ◽  
Junji Shirafuji ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
Boron Doped ◽  
Hot Filament

scholarly journals Polycrystalline Diamond Films produced by Hot-Filament Chemical Vapor Deposition

2017 ◽  
Vol 23 (S1) ◽  
pp. 2272-2273 ◽  
Author(s):  
M.J. Arellano-Jimenez ◽  
J. J. Alcantar-Peña ◽  
J.E. Ortega Aguilar ◽  
M.J. Yacaman ◽  
O. Auciello
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
Hot Filament

Effects of Methane Concentration and Hydrogen Treatment on Preferred Orientation in Diamond Films Grown by Chemical Vapor Deposition

1994 ◽  
Vol 339 ◽  
Author(s):  
D. Ganesan ◽  
S. C. Sharma
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
Preferred Orientation ◽  
Hydrogen Treatment ◽  
X Ray Diffraction ◽  
Diamond Peak ◽  
Hot Filament

ABSTRACTWe have conducted x-ray diffraction, Raman spectroscopy, and scanning electron microscopy analyses of diamond films grown by hot filament assisted chemical vapor deposition (HFCVD). We present results on the relative abundance of the (111), (220) and (400) faces in polycrystalline diamond films as functions of CH4 concentration. The intensity of the (111) peak can be varied from about 20% to 60% by adjusting CH4 in CH4/H2 mixtures. We also present results on preferred orientation in films grown under varying hydrogen treatments. We discuss correlations between the preferred orientation, FWHM of the diamond peak in the Raman spectrum, and surface morphology of the films.

Measurement of The Activation Energy in Phosphorous Doped Polycrystalline Diamond Thin Films Grown on Silicon Substrates by Hot Filament Chemical Vapor Deposition

1996 ◽  
Vol 423 ◽  
Author(s):  
S. Mirzakuchaki ◽  
H. Golestanian ◽  
E. J. Charlson ◽  
T. Stacy
Keyword(s):  
Thin Films ◽  
Activation Energy ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
Silicon Substrates ◽  
Boron Doped Diamond ◽  
Diamond Thin Films ◽  
Hot Filament

AbstractAlthough many researchers have studied boron-doped diamond thin films in the past several years, there have been few reports on the effects of doping CVD-grown diamond films with phosphorous. For this work, polycrystalline diamond thin films were grown by hot filament chemical vapor deposition (HFCVD) on p-type silicon substrates. Phosphorous was introduced into the reaction chamber as an in situ dopant during the growth. The quality and orientation of the diamond thin films were monitored by X-ray diffraction (XRD) and scanning electron microscopy (SEM). Current-voltage (I-V) data as a function of temperature for golddiamond film-silicon-aluminum structures were measured. The activation energy of the phosphorous dopants was calculated to be approximately 0.29 eV.

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