Device physics and modeling of integrated power devices

Author(s):  
M.S. Adler ◽  
D.N. Pattanayak ◽  
B.J. Baliga ◽  
V.A.K. Temple ◽  
H.R. Chang
Keyword(s):  
2016 ◽  
Vol 858 ◽  
pp. 177-180 ◽  
Author(s):  
Rahul Radhakrishnan ◽  
Tony Witt ◽  
Seungchul Lee ◽  
Richard Woodin

Optimized design of Silicon Carbide (SiC) power devices depends, besides power device physics, also on consideration of basic properties and technological readiness of the material. This paper presents a novel analysis of the dependence of variation of epitaxial doping and thickness on the determination of the optimum design point of SiC devices. We introduce electric field at epitaxy-substrate interface as a useful parameter in controlling the dependence of device parameters on epitaxy. Using this method as criterion for design can improve the robustness of SiC devices to epitaxial variation and hence the process yield.


Author(s):  
H.-S. Philip Wong ◽  
Deji Akinwande

2020 ◽  
Vol 13 (12) ◽  
pp. 120101
Author(s):  
Tsunenobu Kimoto ◽  
Heiji Watanabe

1995 ◽  
Author(s):  
S. D. Russell ◽  
W. B. Dubbelday ◽  
R. L. Shimabukuro ◽  
P. R. De La Houssaye

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