Low energy metal ion beam source

Author(s):  
X. Godechot ◽  
I.G. Brown
Keyword(s):  
Ion Beam ◽  
2011 ◽  
Vol 82 (8) ◽  
pp. 083302 ◽  
Author(s):  
Jindřich Mach ◽  
Tomáš Šamořil ◽  
Stanislav Voborný ◽  
Miroslav Kolíbal ◽  
Jakub Zlámal ◽  
...  

1983 ◽  
Vol 22 (Part 1, No. 6) ◽  
pp. 1048-1056 ◽  
Author(s):  
Yoshiyuki Sakai ◽  
Itsuo Katsumata ◽  
Takanori Oshio

2003 ◽  
Vol 42 (Part 1, No. 2A) ◽  
pp. 707-712 ◽  
Author(s):  
Noriyuki Uchida ◽  
Leonid Bolotov ◽  
Toshihiko Kanayama

2012 ◽  
Vol 10 ◽  
pp. 139-144 ◽  
Author(s):  
S. Yoshimura ◽  
M. Kiuchi ◽  
Y. Nishimoto ◽  
M. Yasuda ◽  
A. Baba ◽  
...  

1995 ◽  
Vol 396 ◽  
Author(s):  
Y. Park ◽  
Y.W. Ko ◽  
M.H. Sohn ◽  
S.I. Kim

AbstractA compact negative metal ion beam source for direct low energy metal ion beam depositions studies in ultra high vacuum (UHV) environment, has been developed. The ion source is based on SKION's Solid State Ion Beam Technology. The secondary negative metal ion beam is effectively produced by primary cesium positive ion bombardment (negative ion yield varies from 0.1-0.5 for carbon). The beam diameter is in the range of 0.2∼3.0 cm depending on the focusing and ion beam energy. The ion source produces negative ion currents of about 0.8 mA/cm2. The energy spread of the ion beam is less then ±5% of the ion beam energy. The energy of negative metal ion beam can be independently controlled in the range of 10-300 eV. Due to the complete solid state ion technology , the source can be operated while maintaining chamber pressures of less then 10-10 Torr.


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