Measurements of electron density in different low pressure plasmas using the multipole resonance probe, langmuir probe and optical emission spectroscopy

2016 ◽  
Author(s):  
Moritz Oberberg ◽  
Stefan Ries ◽  
Nikita Bibinov ◽  
Peter Awakowicz
Keyword(s):  
Electron Density ◽  
Langmuir Probe ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Low Pressure

Langmuir Probe and Optical Emission Spectroscopy Studies of Low-Pressure Gas Mixture of CO2and N2

2010 ◽  
Vol 12 (3) ◽  
pp. 314-319 ◽  
Author(s):  
E. F Mendez-Martinez ◽  
P. G Reyes ◽  
D Osorio-Gonzalez ◽  
F Castillo ◽  
H Martinez
Keyword(s):  
Langmuir Probe ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Low Pressure ◽  
Gas Mixture ◽  
Spectroscopy Studies

A novel method to determine electron density by optical emission spectroscopy in low-pressure nitrogen plasmas

2006 ◽  
Vol 13 (12) ◽  
pp. 123501 ◽  
Author(s):  
Xi-Ming Zhu ◽  
Yu-Dong Pu ◽  
Zhi-Gang Guo ◽  
Yi-Kang Pu
Keyword(s):  
Electron Density ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Low Pressure ◽  
Novel Method ◽  
Nitrogen Plasmas

scholarly journals Machine Learning Prediction of Electron Density and Temperature from Optical Emission Spectroscopy in Nitrogen Plasma

Coatings ◽  
2021 ◽  
Vol 11 (10) ◽  
pp. 1221
Author(s):  
Jun-Hyoung Park ◽  
Ji-Ho Cho ◽  
Jung-Sik Yoon ◽  
Jung-Ho Song
Keyword(s):  
Machine Learning ◽  
Electron Temperature ◽  
Real Time ◽  
Electron Density ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Plasma Parameters ◽  
Plasma Nitridation

We present a non-invasive approach for monitoring plasma parameters such as the electron temperature and density inside a radio-frequency (RF) plasma nitridation device using optical emission spectroscopy (OES) in conjunction with multivariate data analysis. Instead of relying on a theoretical model of the plasma emission to extract plasma parameters from the OES, an empirical correlation was established on the basis of simultaneous OES and other diagnostics. Additionally, we developed a machine learning (ML)-based virtual metrology model for real-time Te and ne monitoring in plasma nitridation processes using an in situ OES sensor. The results showed that the prediction accuracy of electron density was 97% and that of electron temperature was 90%. This method is especially useful in plasma processing because it provides in-situ and real-time analysis without disturbing the plasma or interfering with the process.

Characterization of a CH4-RF-plasma by ion flux, Langmuir probe, and optical emission spectroscopy measurements

1992 ◽  
Vol 1 (2-4) ◽  
pp. 121-126 ◽  
Author(s):  
M. Weiler ◽  
R. Kleber ◽  
K. Jung ◽  
H. Ehrhardt
Keyword(s):  
Langmuir Probe ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Ion Flux ◽  
Rf Plasma
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