Chirped pulsed bias power in inductively coupled plasma reactors

2016 ◽  
Author(s):  
Steven J. Lanham ◽  
Mark J. Kushner
Keyword(s):  
Inductively Coupled Plasma ◽  
Plasma Reactors ◽  
Bias Power ◽  
Inductively Coupled

Anisotropic Etching of InP and InGaAs by Using an Inductively Coupled Plasma in Cl2/N2 and Cl2/Ar Mixtures at Low Bias Power

2007 ◽  
Vol 50 (4) ◽  
pp. 1130 ◽  
Author(s):  
J. W. Bae ◽  
C. H. Jeong ◽  
J. T. Lim ◽  
H. C. Lee ◽  
G. Y. Yeom ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
Anisotropic Etching ◽  
Bias Power ◽  
Inductively Coupled

Modelling of Plasma Processes

1983 ◽  
Vol 30 ◽  
Author(s):  
Maher I. Boulos
Keyword(s):  
Heat Transfer ◽  
Mathematical Modelling ◽  
Inductively Coupled Plasma ◽  
Plasma Jets ◽  
Temperature Fields ◽  
Arc Plasma ◽  
Plasma Reactors ◽  
Plasma Particle ◽  
Inductively Coupled ◽  
Plasma Torches

ABSTRACTA review is made of some of the mathematical modelling work carried out over the last few years with the objective of computing the flow and temperature fields for different thermal plasma systems. Typical results are given for d.c. plasma jets, transfered and non-transfered arc plasma reactors and for inductively coupled plasma torches. This is followed by a brief discussion of the important problem of plasma-particle heat transfer.

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