IIB-2 fabrication of fully self-aligned 3-D CMOS structures by high dose nitrogen ion implantation
1986 ◽
Vol 33
(11)
◽
pp. 1841-1841
1985 ◽
Vol 1
(9)
◽
pp. 1069-1070
◽
2003 ◽
Vol 206
◽
pp. 994-998
◽
Keyword(s):
1999 ◽
Vol 152
(1)
◽
pp. 65-79
◽
Keyword(s):
2010 ◽
Vol 30
(2)
◽
pp. 126-129
◽
Keyword(s):
Keyword(s):
1994 ◽
Vol 66
(1-3)
◽
pp. 291-295
◽
Keyword(s):