Engineering of Flexo- and Gravure-Printed Indium–Zinc-Oxide Semiconductor Layers for High-Performance Thin-Film Transistors

2015 ◽  
Vol 62 (9) ◽  
pp. 2871-2877 ◽  
Author(s):  
Dieter Spiehl ◽  
Marc Haming ◽  
Hans Martin Sauer ◽  
Klaus Bonrad ◽  
Edgar Dorsam
Keyword(s):  
Thin Film ◽  
Zinc Oxide ◽  
Thin Film Transistors ◽  
High Performance ◽  
Oxide Semiconductor ◽  
Indium Zinc Oxide

scholarly journals Amorphous Hafnium-Indium-Zinc Oxide Semiconductor Thin Film Transistors

2012 ◽  
Vol 2012 ◽  
pp. 1-4 ◽  
Author(s):  
Sheng-Po Chang ◽  
San-Syong Shih
Keyword(s):  
Thin Film ◽  
Zinc Oxide ◽  
Thin Film Transistors ◽  
Oxide Semiconductor ◽  
Subthreshold Slope ◽  
Field Effect Mobility ◽  
Excellent Performance ◽  
Current Ratio ◽  
Indium Zinc Oxide ◽  
Sputtering Power

We reported on the performance and electrical properties of co-sputtering-processed amorphous hafnium-indium-zinc oxide (α-HfIZO) thin film transistors (TFTs). Co-sputtering-processedα-HfIZO thin films have shown an amorphous phase in nature. We could modulate the In, Hf, and Zn components by changing the co-sputtering power. Additionally, the chemical composition ofα-HfIZO had a significant effect on reliability, hysteresis, field-effect mobility (μFE), carrier concentration, and subthreshold swing (S) of the device. Our results indicated that we could successfully and easily fabricateα-HfIZO TFTs with excellent performance by the co-sputtering process. Co-sputtering-processedα-HfIZO TFTs were fabricated with an on/off current ratio of~106, higher mobility, and a subthreshold slope as steep as 0.55 V/dec.

High‐Performance Thin‐Film Transistors with Nickel‐Doped Indium Zinc Oxide Channel Layers

2019 ◽  
Vol 216 (18) ◽  
pp. 1900274 ◽  
Author(s):  
Dong Lin ◽  
Kaiwen Li ◽  
Jingjing Shao ◽  
Qun Zhang
Keyword(s):  
Thin Film ◽  
Zinc Oxide ◽  
Thin Film Transistors ◽  
High Performance ◽  
Indium Zinc Oxide

Temporal and voltage stress stability of high performance indium-zinc-oxide thin film transistors

2017 ◽  
Vol 136 ◽  
pp. 43-50 ◽  
Author(s):  
Yang Song ◽  
Alexander Katsman ◽  
Amy L. Butcher ◽  
David C. Paine ◽  
Alexander Zaslavsky
Keyword(s):  
Thin Film ◽  
Zinc Oxide ◽  
Thin Film Transistors ◽  
High Performance ◽  
Oxide Thin Film ◽  
Zinc Oxide Thin Film ◽  
Indium Zinc Oxide ◽  
Voltage Stress

Influence of a self-assembled monolayer on indium-zinc-oxide semiconductor thin-film transistors

2014 ◽  
Vol 65 (10) ◽  
pp. 1555-1558 ◽  
Author(s):  
Yong Suk Yang ◽  
In-Kyu You ◽  
Sung-Hoon Hong ◽  
Ju-hyeon Park ◽  
Ho-Gyeong Yun ◽  
...  
Keyword(s):  
Thin Film ◽  
Zinc Oxide ◽  
Thin Film Transistors ◽  
Oxide Semiconductor ◽  
Self Assembled Monolayer ◽  
Indium Zinc Oxide ◽  
Semiconductor Thin Film ◽  
Self Assembled

Amorphous Indium–Zinc Oxide Semiconductor Thin-Film Transistors

2014 ◽  
Vol 9 (3) ◽  
pp. 388-391
Author(s):  
Jun-Yi Li ◽  
Sheng-Po Chang ◽  
Wen-Chen Hua ◽  
Shoou-Jinn Chang
Keyword(s):  
Thin Film ◽  
Zinc Oxide ◽  
Thin Film Transistors ◽  
Oxide Semiconductor ◽  
Indium Zinc Oxide ◽  
Semiconductor Thin Film
Sign in / Sign up

Export Citation Format

Share Document